Abstract.It is offered to operate the transmittance of a diffraction mask by changing the interference properties of a thin optical layer. Based on the results of the offered approach the amplitude-phase diffraction grating with the period of 300 microns has been made from the 115 nm transparent indium tin oxide (ITO) film. Optical and dimensional parameters of the diffraction mask have been investigated by using the ellipsometry, interferometry and spectroscopy. Computer modeling of the diffraction scattering and its experimental investigation have been carried out.Keywords: amplitude-phase diffraction grating, thin layer, indium tin oxide, ellipsometry, interferometry, spectroscopy Citation: Paranin VD, Karpeev SV. Amplitude -phase diffraction gratings based on thin layer of indium tin oxide.