1993
DOI: 10.1063/1.110456
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Spatial variations in the charge density of argon discharges in the Gaseous Electronics Conference reference reactor

Abstract: The spatially dependent ion and electron concentrations of argon discharges in the gaseous electronics conference reference reactor reach a saddle point maximum in the center of the glow. The concentrations were measured using a Langmuir probe. The charge density decreases in the axial direction from the glow center to the electrode sheath edges as expected. In contrast, the charge density increases in the radial direction from the glow center to the radial electrode edge. The maximum occurs approximately 1 cm… Show more

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Cited by 55 publications
(37 citation statements)
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“…With an increasing RF voltage, the discharge also expanded into the outer chamber and transformed into the anomalous mode. Nonuniform radial distribution of plasma parameters in GEC cell was predicted in theory in [33] and [38], whereas the paper of Overzet and Hopkins [26] demonstrated in experiment the presence of the plasma density maximum near the radial boundary of electrodes in agreement with the results of our paper. Fig.…”
Section: Resultssupporting
confidence: 81%
“…With an increasing RF voltage, the discharge also expanded into the outer chamber and transformed into the anomalous mode. Nonuniform radial distribution of plasma parameters in GEC cell was predicted in theory in [33] and [38], whereas the paper of Overzet and Hopkins [26] demonstrated in experiment the presence of the plasma density maximum near the radial boundary of electrodes in agreement with the results of our paper. Fig.…”
Section: Resultssupporting
confidence: 81%
“…They studied the distribution of the capacitive, inductive and total power across the electrode area at different frequencies and plasma concentration values. Overzet and Hopkins [16] obtained with a Langmuir probe that in a GEC (Gaseous Electronics Conference) reference cell the radial profile of the plasma concentration possessed an abrupt peak near the electrode edge associated with an increased electric field in this region. Lai et al [17] employed the SCCMÔ asymmetric discharge chamber (SCCMÔ is a registered trademark or a trademark of Tokyo Electron Limited in Japan and other countries) and obtained the donut-shaped profile of etching (with the smallest etching rate at the centre and at the very edge of the plate, whereas the largest etching rate was observed approximately at the distance of 5/8 radius from the plate centre).…”
Section: Introductionmentioning
confidence: 99%
“…[12]. In an asymmetric discharge, the densities near the grounded electrode are low throughout the cycle.…”
Section: Modeling Resultsmentioning
confidence: 99%