1977
DOI: 10.1007/bf02660341
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Some prospective applications of silicon electrodeposition from molten fluorides to solar cell fabrication

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Cited by 56 publications
(27 citation statements)
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“…[3] Elwell et al [4] and Bouteillon et al [5] later obtained compact and smooth Si films on Ag or graphite substrates in molten LiF-NaF-KF-K 2 SiF 6 .R ecently Yasuda et al achieved relatively good quality deposits in molten KF-KCl, using K 2 SiF 6 or SiCl 4 as the Si precursor. [3] Elwell et al [4] and Bouteillon et al [5] later obtained compact and smooth Si films on Ag or graphite substrates in molten LiF-NaF-KF-K 2 SiF 6 .R ecently Yasuda et al achieved relatively good quality deposits in molten KF-KCl, using K 2 SiF 6 or SiCl 4 as the Si precursor.…”
mentioning
confidence: 99%
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“…[3] Elwell et al [4] and Bouteillon et al [5] later obtained compact and smooth Si films on Ag or graphite substrates in molten LiF-NaF-KF-K 2 SiF 6 .R ecently Yasuda et al achieved relatively good quality deposits in molten KF-KCl, using K 2 SiF 6 or SiCl 4 as the Si precursor. [3] Elwell et al [4] and Bouteillon et al [5] later obtained compact and smooth Si films on Ag or graphite substrates in molten LiF-NaF-KF-K 2 SiF 6 .R ecently Yasuda et al achieved relatively good quality deposits in molten KF-KCl, using K 2 SiF 6 or SiCl 4 as the Si precursor.…”
mentioning
confidence: 99%
“…One promising approach is direct fabrication of Si films from inexpensive Si-based compounds via electrochemical techniques.E lectrodeposition of crystalline Si films from fluoride-based molten salts has been investigated since the 1970s.Cohen first reported successful plating of Si films onto an Ag coated Si wafer in molten LiF-KF-K 2 SiF 6 . [3] Elwell et al [4] and Bouteillon et al [5] later obtained compact and smooth Si films on Ag or graphite substrates in molten LiF-NaF-KF-K 2 SiF 6 .R ecently Yasuda et al achieved relatively good quality deposits in molten KF-KCl, using K 2 SiF 6 or SiCl 4 as the Si precursor. [6] Similar work or reviews can be found in the literature.…”
mentioning
confidence: 99%
“…Cohen and Huggins studied electrodeposition of silicon to solar cell fabrication in the 1970s. , Epitaxial and polycrystalline continuous films were electrodeposited from molten fluorides (K 2 SiF 6 , LiF, KF, and KF+HF) at 750 °C on Si, Ag, W, and Nb substrates using pure Si as an anode. The coatings were characterized as dense, coherent, and well adherent to Si as well as various metal substrates.…”
Section: Thin Si Filmsmentioning
confidence: 99%
“…Silver has preferentially been used as a cathode material because Si easily nucleates on Ag and does not dissolve in the substrate. ,, Dense, coherent, and adherent Si layers up to 3 mm thick were deposited on the Ag substrate using K 2 SiF 6 in fluoride melts . Pure Si layers up to 300 μm thick were deposited on Ag in LiF–KF and LiF–NaF–KF eutectic mixtures while using K 2 SiF 6 as an additive .…”
Section: Thin Si Filmsmentioning
confidence: 99%
“…Currently, silicon and silicon-based composite materials are widely used in microelectronics, solar energy devices, as well as in the manufacture of portable energy storage devices [1][2][3]. In particular, a new lithium-ion battery (LIB) with a silicon-based anode is being actively developed.…”
Section: Introductionmentioning
confidence: 99%