2010
DOI: 10.1002/adfm.201000785
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Solution‐Processed Zinc Oxide as High‐Performance Air‐Stable Electron Injector in Organic Ambipolar Light‐Emitting Field‐Effect Transistors

Abstract: Electron injection from the source–drain electrodes limits the performance of many n‐type organic field‐effect transistors (OFETs), particularly those based on organic semiconductors with electron affinities less than 3.5 eV. Here, it is shown that modification of gold source–drain electrodes with an overlying solution‐deposited, patterned layer of an n‐type metal oxide such as zinc oxide (ZnO) provides an efficient electron‐injecting contact, which avoids the use of unstable low‐work‐function metals and is co… Show more

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Cited by 85 publications
(91 citation statements)
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“…The first reported use of oxide buffer layers in OLEDs was by Tokito et al 61 in 1996. Now, transition metal oxides are heavily utilized in OLEDs, 60 OPVs, [92][93][94][95][96][97] and OFETs, [98][99][100][101][102][103][104] and are components in many of the current record-breaking devices reported in the literature. 2,105 Transition metal oxides can possess a wide range of work functions, spanning from extreme low of 3.5 eV for defective ZrO 2 to the extreme high of 7.0 eV for stoichiometric V 2 O 5 .…”
Section: Transition Metal-oxide Buffer Layersmentioning
confidence: 99%
“…The first reported use of oxide buffer layers in OLEDs was by Tokito et al 61 in 1996. Now, transition metal oxides are heavily utilized in OLEDs, 60 OPVs, [92][93][94][95][96][97] and OFETs, [98][99][100][101][102][103][104] and are components in many of the current record-breaking devices reported in the literature. 2,105 Transition metal oxides can possess a wide range of work functions, spanning from extreme low of 3.5 eV for defective ZrO 2 to the extreme high of 7.0 eV for stoichiometric V 2 O 5 .…”
Section: Transition Metal-oxide Buffer Layersmentioning
confidence: 99%
“…Diethanolamine is known to reduce work function when doped into ZnO [33] and surface modifiers e.g. polymers containing simple aliphatic amine groups are also reported to substantially reduce work function, ii) zinc acetate decompositionAt 200 -300 °C residual hydroxyl species may be acting as shallow surface donors [18,23,34] owing to partial decomposition of the acetate species which is not complete until 310 °C [35] and iii) ZnO crystallization -rapid decomposition occurs above 300 °C where the oxide becomes more heavily n-doped by intrinsic defects i.e. Zn interstitials and O vacancies, which as temperature is further increased are partially recovered by the improved ZnO crystallinity [25,32,36] .…”
Section: Opv Device Performance With Etl Processing Temperature Variamentioning
confidence: 99%
“…However, as the channel resistance decreases due to the increase of organic semiconductor mobilities, contact resistances often become the bottleneck for the total device performance [1,9,10]. Many strategies have been reported to decrease the contact resistance for either holes or electrons [1,10,11], using selfassembled monolayers [12,13], doping [14,15], interlayers [16,17], or by changing the device lay-out [9,18]. Contact resistance is an (even) more fundamental problem in ambipolar transistors, where both electrons and holes need to be injected [5,19].…”
Section: Introductionmentioning
confidence: 99%