1987
DOI: 10.1049/el:19870244
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Solution-doping technique for fabrication of rare-earth-doped optical fibres

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Cited by 321 publications
(108 citation statements)
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“…Fabrication of rare earth (RE 3+ )-doped optical fibers is typically performed by solution doping [2] where salts of the rare earth ion, such as ErCl 3 and Al (added to decrease clustering of the REs) are dissolved in a solvent and introduced into a layer of porous silica "soot" that is subsequently dried and consolidated to form the fiber core. However, there is no mechanism for controlling the molecular environment about the RE 3+ ions when solution doped into the homogeneous glass.…”
Section: Introductionmentioning
confidence: 99%
“…Fabrication of rare earth (RE 3+ )-doped optical fibers is typically performed by solution doping [2] where salts of the rare earth ion, such as ErCl 3 and Al (added to decrease clustering of the REs) are dissolved in a solvent and introduced into a layer of porous silica "soot" that is subsequently dried and consolidated to form the fiber core. However, there is no mechanism for controlling the molecular environment about the RE 3+ ions when solution doped into the homogeneous glass.…”
Section: Introductionmentioning
confidence: 99%
“…Yb/Tm co-doped yttrium-alumino-silicate (YAS) fibers were fabricated by modified chemical vapor deposition (MCVD) process in conjunction with solution doping (SD) technique. Since 1987, SD technique has been used to incorporate rare-earths [12] and nanoparticles [10,[13][14][15][16] into the silica glass matrix of optical fibers.…”
Section: Fiber Fabrication and Materials Analysismentioning
confidence: 99%
“…Moreover, core refractive index is required to be the same as that of the cladding in most of these designs such as PCF, LCF, Re-LCF, 2D-ASPBGF, Bragg fiber, MTF, and PTF and this requires microstructuration or pixelation of doped core in order to match the refractive index with undoped cladding, which is a cumbersome process to do. On the other hand, SIF can be fabricated with conventional technique, such as Modified Chemical Vapor Deposition Process (MCVD) in conjunction with solution doping process [16][17][18] and suitable for mass production. Ming-Jun Li et al demonstrated that the maximum scalable mode area for effective single mode operation from a SIF is 370µm 2 for 1060nm operation taking into account the core numerical aperture (NA) to be 0.06 that could be achieved experimentally at the time of publishing the paper in 2009 [19].…”
Section: Introductionmentioning
confidence: 99%