“…4 It is imperative to decrease the thermal processing temperature to prevent interdiffusion between the elements of the films and the substrate and to prevent the evaporation of lead and lead oxide from the surface of the films. 5,6 The sol-gel method has been widely used to achieve the low-temperature deposition of PZT films, and typical approaches include the introduction of a seed layer or a template layer, 7,8 using special substrates with perfect lattice matching to PZT, 9 the improvement in the homogeneity of the precursor solution, 10 inhibiting the crystallization of the pyrochlore phase at a low temperature by rapid annealing, 11 decreasing thickness of PZT films as thin as possible, 12 as well as laser-induced phase transformation from amorphous to perovskite in PZT films by laser annealing. 13 In recent years, a new approach to decrease the processing temperature is the heating of PZT films by microwave irradiation or microwave annealing.…”