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Digital Encyclopedia of Applied Physics 2019
DOI: 10.1002/3527600434.eap808
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Sol–Gel Deposition of Thin Films

Abstract: One of the most important applications of sol–gel processing is in the preparation of thin films. Thin‐film formation is possible due to deposition of alkoxide followed by exposure to moisture. There are various methods for thin‐film coating or deposition using sol–gel technique. However, the basic steps are almost similar, which include exhausting, excess deposit material processing, and then drying. The physical properties and microstructure of films (density, porosity etc.) are governed by the structure of … Show more

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Cited by 4 publications
(3 citation statements)
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“…Chemical deposition depends on the chemistry of solutions, pH, viscosity and so on. Among the paramount techniques used in chemical deposition is the sol-gel [39][40][41] route, which produces high-quality films with low equipment requirements. Additionally, this process produces a large quantity of nanosized films with modeled and controlled particle size, morphology, orientation and crystal structure, as well as optimized physical and chemical properties [42].…”
Section: Introductionmentioning
confidence: 99%
“…Chemical deposition depends on the chemistry of solutions, pH, viscosity and so on. Among the paramount techniques used in chemical deposition is the sol-gel [39][40][41] route, which produces high-quality films with low equipment requirements. Additionally, this process produces a large quantity of nanosized films with modeled and controlled particle size, morphology, orientation and crystal structure, as well as optimized physical and chemical properties [42].…”
Section: Introductionmentioning
confidence: 99%
“…17−19 It mainly contains two processes, that is, (a) direction migration of suspended and charged colloidal particles/molecules in dispersed media under an applied electric field, and (b) particle/molecule deposition on the surface of an oppositely charged electrode to form uniform and compact coatings. 20 In general, solid particles having particle sizes <30 μm can be deposited by EPD with ease, including metals, 21,22 carbides, 23−25 oxides, 26,27 polymers, 12,28 inorganic salts, 29,30 etc. It has the advantages of a simple process using only basic equipment, relatively low cost, short deposition time at room temperature with controlled thickness, high adhesion strength of deposits, and the possibility of codeposition of different particles.…”
Section: Introductionmentioning
confidence: 99%
“…As an improvement, electrophoretic deposition (EPD) is widely applied for ceramic suspensions, which has attracted increasing interest in the development of advanced materials and contributed to obtain higher thickness from silica sol with enhanced corrosion resistance. It mainly contains two processes, that is, (a) direction migration of suspended and charged colloidal particles/molecules in dispersed media under an applied electric field, and (b) particle/molecule deposition on the surface of an oppositely charged electrode to form uniform and compact coatings . In general, solid particles having particle sizes <30 μm can be deposited by EPD with ease, including metals, , carbides, oxides, , polymers, , inorganic salts, , etc.…”
Section: Introductionmentioning
confidence: 99%