2017 Symposium on Design, Test, Integration and Packaging of MEMS/MOEMS (DTIP) 2017
DOI: 10.1109/dtip.2017.7984454
|View full text |Cite
|
Sign up to set email alerts
|

Soft mold NanoImprint Lithography: A versatile tool for sub-wavelength grating applications

Abstract: Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the realization of optical filters from the conception to the optical characterization. Those filters can be realized on large surfaces (up to 6'' diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compa… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
5
0

Year Published

2019
2019
2020
2020

Publication Types

Select...
4
1

Relationship

1
4

Authors

Journals

citations
Cited by 6 publications
(5 citation statements)
references
References 7 publications
0
5
0
Order By: Relevance
“…The GMRF is fabricated by soft-mold nano-imprint lithography, as reported in [49] on a 4 inch wafer. First, a multilayer stack is deposited by inductively-coupled-plasma plasmaenhanced chemical vapor deposition (ICP-PECVD) on a glass substrate.…”
Section: Laser Designmentioning
confidence: 99%
See 1 more Smart Citation
“…The GMRF is fabricated by soft-mold nano-imprint lithography, as reported in [49] on a 4 inch wafer. First, a multilayer stack is deposited by inductively-coupled-plasma plasmaenhanced chemical vapor deposition (ICP-PECVD) on a glass substrate.…”
Section: Laser Designmentioning
confidence: 99%
“…Eventually, the wafer is diced into 5 × 5 mm 2 individual filters. Under normal incidence, the GMRF exhibits a 85% reflectivity peak at 1506 nm with a FWHM of 1.8 nm (see [49] for a detailed description of the fabrication process and the final structure).…”
Section: Laser Designmentioning
confidence: 99%
“…The first layer of the waveguide upper-cladding layer, made of Si 3 N 4 , was deposited using an Inductive-Coupled-Plasma Plasma-Enhanced Chemical Vapor Deposition system. The designed gratings were subsequently patterned into this layer using nano-imprint lithography 12 and dry etching with the LiNbO 3 top surface acting as an etch-stop interface. The device fabrication was completed by the deposition of a 323-nm-thick SiO 2 upper cladding layer on top of the grating structure and of a 266-nm-thick SiO 2 single-layer anti-reflective coating on the rear-side of the substrate to avoid back-reflection.…”
Section: Fabricationmentioning
confidence: 99%
“… For periods inferior to 1µm, nanoimprint lithography (NIL) was carried out. A home-made resin (NILUV, (Doucet et al 2016)) is used for soft mold NIL process (Pelloquin et al 2018).…”
Section: Materials and Implementationmentioning
confidence: 99%