“…[69,70] Electrochemical deposition of Cd and Pb on methylÀSi(111) was reported to preserve the electrical properties of the monolayer, [68] i.e., which we know now to imply that the junction remained inverted. Atomic layer deposition (ALD) is at present the most promising alternative to non-vacuum deposition methods that are non-invasive, [188] such as Hg, [63,133,154,189] LOFO, [64,87,190] PALO, [191] MoPALO. [20,192] Chemical reactivity across the monolayer explains also why Hg works well with Si or Ag substrate but not with, e.g., Au (amalgamation).…”