2003
DOI: 10.1016/s0927-0248(02)00192-7
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SnS thin films fabricated by pulsed and normal electrochemical deposition

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Cited by 69 publications
(39 citation statements)
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“…(4) and this value is in a good agreement with the obtained value by Roy et al [27], T. Keuchi et al [28] and Doña and Herrero [29]. The imaginary part of the complex index of refraction k is a measure of the fraction of light lost due to scattering and absorption per unit distance of the penetration medium.…”
Section: International Letters Of Chemistry Physics and Astronomy Vosupporting
confidence: 86%
“…(4) and this value is in a good agreement with the obtained value by Roy et al [27], T. Keuchi et al [28] and Doña and Herrero [29]. The imaginary part of the complex index of refraction k is a measure of the fraction of light lost due to scattering and absorption per unit distance of the penetration medium.…”
Section: International Letters Of Chemistry Physics and Astronomy Vosupporting
confidence: 86%
“…Additionally, it has the advantage of its constituent elements being abundant in nature and not possessing any health and environmental hazards. Therefore, SnS can be potentially used as photovoltaic materials [9,10] and as a holographic recording medium [11].…”
Section: Introductionmentioning
confidence: 99%
“…SnS thin films have been deposited by different techniques such as: the vacuum evaporation of the SnS compound [5], two stage process [6] and electrochemical deposition [7]. In this work, thin films of SnS have been grown by coevaporation of the precursor species.…”
Section: Introductionmentioning
confidence: 99%