Figure 1: Overview of our Dual Strip Weaving approach for the design of quadrilateral patch layouts. a) When hovering over the object, the user is immediately presented with the best elastica strip (visualized using a stripe pattern) at the current pointer position. It can be selected and fixed with a single click. b) Fixed strips (blue) constrain the design space; only compatible strips are offered next (green). c) Indicators based on color-coding and stripe patterns guide the user to regions where modifications are recommended for the benefit of layout quality. d) Finally, the implied quad layout structure is derived from a collection of strips. The accompanying video shows the entire process.
AbstractWe introduce Dual Strip Weaving, a novel concept for the interactive design of quad layouts, i.e. partitionings of freeform surfaces into quadrilateral patch networks. In contrast to established tools for the design of quad layouts or subdivision base meshes, which are often based on creating individual vertices, edges, and quads, our method takes a more global perspective, operating on a higher level of abstraction: the atomic operation of our method is the creation of an entire cyclic strip, delineating a large number of quad patches at once. The global consistency-preserving nature of this approach reduces demands on the user's expertise by requiring less advance planning. Efficiency is achieved using a novel method at the heart of our system, which automatically proposes geometrically and topologically suitable strips to the user. Based on this we provide interaction tools to influence the design process to any desired degree and visual guides to support the user in this task.