2017
DOI: 10.1016/j.sse.2016.11.012
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Small-signal characterization and modelling of 55nm SiGe BiCMOS HBT up to 325GHz

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Cited by 16 publications
(12 citation statements)
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“…Calibration has been carried out with impedance standard substrate (ISS) and the calibration methods used were LRRM (line-reflect-reflectmatch) and TRL (Thru, Reflect, Line). In [14], Deng et al have presented an exhaustive set of S parameter measurements up to 325 GHz on HBTs from an advanced 55nm BiCMOS technology using a similar approach as [13] for calibration (LRRM on ISS ). Finally, Williams et al [15] have presented measurement results from an silicon on insulator (SOI) technology, where passive elements have been characterized up to 500 GHz, while the transistor measurement was performed up to 110 GHz.…”
mentioning
confidence: 99%
“…Calibration has been carried out with impedance standard substrate (ISS) and the calibration methods used were LRRM (line-reflect-reflectmatch) and TRL (Thru, Reflect, Line). In [14], Deng et al have presented an exhaustive set of S parameter measurements up to 325 GHz on HBTs from an advanced 55nm BiCMOS technology using a similar approach as [13] for calibration (LRRM on ISS ). Finally, Williams et al [15] have presented measurement results from an silicon on insulator (SOI) technology, where passive elements have been characterized up to 500 GHz, while the transistor measurement was performed up to 110 GHz.…”
mentioning
confidence: 99%
“…In [8], the calibration has been carried out with impedance standard substrate (ISS) and the calibration methods used were LRRM (line-reflect-reflect-match) and TRL (Thru, Reflect, Line). In [9], Deng et al have presented an exhaustive set of S-parameter measurements up to 325 GHz on HBTs from an advanced 55nm BiCMOS technology using calibration approach (LRRM on ISS) similar to [8]. Unfortunately, measurements in [8], [9] were not benchmarked with EM simulation.…”
Section: Calibration and De-embedding Methodsmentioning
confidence: 99%
“…In [9], Deng et al have presented an exhaustive set of S-parameter measurements up to 325 GHz on HBTs from an advanced 55nm BiCMOS technology using calibration approach (LRRM on ISS) similar to [8]. Unfortunately, measurements in [8], [9] were not benchmarked with EM simulation. The report presented by Williams et al in [5] clearly shows the limitations of off-wafer calibration methods by comparing them with the on-wafer TRL method.…”
Section: Calibration and De-embedding Methodsmentioning
confidence: 99%
“…In order to research and develop the application of millimeter wave devices in the commercial world, accurate on-wafer measurement is a key requirement since it eliminates the additional errors and uncertainties introduced by the device package [1][2][3]. For this purpose, careful on-wafer calibrations must be employed to eliminate the systematic errors typically caused by system directivity, loss/delay of measurement paths, or the mismatch of measurement ports.…”
Section: Introductionmentioning
confidence: 99%