2007
DOI: 10.1016/j.susc.2006.08.041
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Site selective atomic chlorine adsorption on the Si(111)7×7 surface

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Cited by 7 publications
(9 citation statements)
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References 28 publications
(41 reference statements)
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“…The clean silicon sample was exposed by passing trichloroethylene vapor into the main chamber from the gas line via a precision variable leak valve. 13 It has been shown that at exposure of Si͑111͒7 ϫ 7 to trichloroethylene at room temperature results in thermal dissociation of the molecule into an atomic chlorine product and a chlorovinyl group. 13 At very low dosage levels, both products chemisorb and are left separated with an average distance of 30 Å.…”
Section: Methodsmentioning
confidence: 99%
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“…The clean silicon sample was exposed by passing trichloroethylene vapor into the main chamber from the gas line via a precision variable leak valve. 13 It has been shown that at exposure of Si͑111͒7 ϫ 7 to trichloroethylene at room temperature results in thermal dissociation of the molecule into an atomic chlorine product and a chlorovinyl group. 13 At very low dosage levels, both products chemisorb and are left separated with an average distance of 30 Å.…”
Section: Methodsmentioning
confidence: 99%
“…13 It has been shown that at exposure of Si͑111͒7 ϫ 7 to trichloroethylene at room temperature results in thermal dissociation of the molecule into an atomic chlorine product and a chlorovinyl group. 13 At very low dosage levels, both products chemisorb and are left separated with an average distance of 30 Å. At this level of separation the chlorine atoms can considered to be isolated, i.e., with very little effect from other adsorbates.…”
Section: Methodsmentioning
confidence: 99%
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“…Also, large molecules can now be rotated and translated by small amounts on a surface, TBPP for example [23]. Atomic manipulation can even be used as a characterization tool for identifying products of surface dissociation studies, for example chlorine atoms from trichloroethylene [24]. Also noteworthy are recent results showing non-local STM induced manipulations (See [25] and references within) where it appears that the spread of injected carriers over ≈ 100 Å after tunneling plays an important role.…”
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confidence: 99%