Site controlled metal and semiconductor quantum dots on epitaxial fluoride films

Photochemical reaction based on a nonadiabatic transition by an optical near-field observed in chemical vapor deposition

“…For NFO-CVD, however, the optical nearfield activates the molecule and the photo-dissociated Zn atom is adsorbed under the fiber probe. In NFO-CVD, the deposition rate was similar to the deposition rate using diethylzinc (DEZn) gas, although with conventional optical CVD, DEZn has a deposition rate more than 1000 times greater than that of Zn(acac) 2 . We believe that the physical origin of the photodissociation of Zn(acac) 2 is also a nonadiabatic photochemical process due to an optical near-field [10].…”

“…In the self-organized growth method [1], spatial precision is insufficient to meet this requirement. To improve the precision, an e-beam [2], a scanning tunneling microscope (STM) [3], and surface modification [4] have all been used for site-control of the substrate. These methods have a disadvantage in that the materials that can be deposited are limited.…”