1989
DOI: 10.1149/1.2096293
|View full text |Cite
|
Sign up to set email alerts
|

Singular Perturbation Analysis of the Faradaic Impedance of Copper Dissolution Accounting for the Effects of Finite Rates of a Homogeneous Reaction

Abstract: The frequency response of the dissolution of a copper rotating disk in 0.1 N HCl is investigated. Specifically, the effect of accounting for finite rates of the homogeneous complexing reaction is explored by utilizing a perturbation analysis to split the diffusion boundary layer into inner and outer regions so that the salient features of the problem can be examined separately. Formulating the singular perturbation problem lea:ds to a better understanding of the physical nature of the faradaic impedance of the… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

0
7
0

Year Published

1995
1995
2024
2024

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 13 publications
(7 citation statements)
references
References 6 publications
0
7
0
Order By: Relevance
“…3 for different potentials. For the whole potential range, the current is under a mixed control, and the overall current can be analyzed according to the expression 1 I = 10 + I:' + C.'fr" [6] The parameters involved in Eq. 6 were obtained by a fitting procedure and are given in Table I. A nondiffusional current 1,, appears in this potential domain, and its variation is not monotonic with the potential.…”
Section: Resultsmentioning
confidence: 99%
“…3 for different potentials. For the whole potential range, the current is under a mixed control, and the overall current can be analyzed according to the expression 1 I = 10 + I:' + C.'fr" [6] The parameters involved in Eq. 6 were obtained by a fitting procedure and are given in Table I. A nondiffusional current 1,, appears in this potential domain, and its variation is not monotonic with the potential.…”
Section: Resultsmentioning
confidence: 99%
“…It is well known that the CuCl film at the film/solution interface can be partially dissolved to form CuCl2 - [59,60], while at [Cl -] >1 mol/L NaCl, there can be formation of CuCl3 2and CuCl4 3complexes, depending on the chloride ion concentration [61]. For example, the following reaction can occur:…”
Section: Structure Morphology and Chemical Characterization Of The Powder And Coatingmentioning
confidence: 99%
“…Although the computation of impedance using this method is relatively simple, it can lead to ambiguous results because in some cases more than one electrical circuit can represent the same electrochemical process [6]. A different approach is to begin with a physicochemical model including kinetics and/or mass transport effects [7][8][9][10][11][12][13][14][15][16][17][18][19][20]. If a perturbation with a small enough amplitude is applied, then the model can be linearized.…”
Section: Introductionmentioning
confidence: 99%
“…Other models have included diffusion and convection within the transport equations. Convection is often incorporated as a complex variable called the Warburg impedance in models that consider uncoupled mass transport equations [8][9][10][11][12][13]. This approach involves solving the transport equation for the species that includes diffusion and convection through a semi-infinite boundary layer.…”
Section: Introductionmentioning
confidence: 99%