2004
DOI: 10.1143/jjap.43.l1555
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Single Mode 1.3 µm InGaAsN/GaAs Quantum Well Vertical Cavity Surface Emitting Lasers Grown by Molecular Beam Epitaxy

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Cited by 10 publications
(10 citation statements)
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“…A 0.3 mm Si-doped GaAs layer of $6 Â 10 16 cm À3 was first grown at 580 C, followed by a 60-A ˚-thick InGaAsN layer containing 2% N and grown at 420 C. High-quality InGaAsN lasers emitting at 1.3 mm can be grown at this temperature. 19) Too high a growth temper-ature may result in spinodal decomposition, 12) and too low a growth temperature degrades PL efficiency. 20) Details of the relation between the quality of the InGaAsN layers and the growth temperatures can be found elesewhere.…”
Section: Methodsmentioning
confidence: 99%
“…A 0.3 mm Si-doped GaAs layer of $6 Â 10 16 cm À3 was first grown at 580 C, followed by a 60-A ˚-thick InGaAsN layer containing 2% N and grown at 420 C. High-quality InGaAsN lasers emitting at 1.3 mm can be grown at this temperature. 19) Too high a growth temper-ature may result in spinodal decomposition, 12) and too low a growth temperature degrades PL efficiency. 20) Details of the relation between the quality of the InGaAsN layers and the growth temperatures can be found elesewhere.…”
Section: Methodsmentioning
confidence: 99%
“…4(b). Possible reasons to account for the increased GVS are 1) the slight increase of the 2DEG concentration due to the decreased band gap in the InGaAsSb/GaAs QW [6], [12]- [15] and 2) the enhanced channel confinement capability due the increased channel/buffer discontinuities to suppress the substrate leakages at higher channel potentials [16]. Thus, a more negative gate bias was required to deplete the carriers in the InGaAsSb channel.…”
Section: Materials Growth and Device Fabricationmentioning
confidence: 99%
“…The InGaAsN/GaAs heterostructures possess the advantages of improving electron confinement at high temperatures due to their high conductionband discontinuity barriers. In x Ga 1−x As 1−y N y , which may be strained or lattice-matched to the GaAs substrate, has been applied to 1.3-µm laser diodes [4]- [6]. Besides, InGaAsNbased heterojunction bipolar transistors (HBTs) [7]- [9] have also demonstrated significant reductions in the turn-on voltages Manuscript as compared to the AlGaAs-based HBTs.…”
Section: Introductionmentioning
confidence: 99%
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“…Long-wavelength, 1.2 -1.3 mm laser diodes with In x Ga 1Àx As 1Ày N y or InGaAsNSb compounds grown on the GaAs substrates have attracted great interest. [3][4][5] InGaAsN-based heterojunction bipolar transistors (HBTs) [6][7][8] have also demonstrated significant reductions in the turn-on voltage compared with AlGaAs-based HBTs. Although the incorporation of nitrogen atoms into InGaAs compounds can reduce the energy band gap, so far this has usually resulted in poor crystal quality crystals.…”
Section: Introductionmentioning
confidence: 99%