Simultaneous determination of composition and mass thickness of thin films by quantitative x-ray fluorescence analysis

Laguitton, D; Parrish, W.

doi:10.1021/ac50016a023

Cited by 63 publications

(22 citation statements)

References 19 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Data from a magnetic YSmTmCaGeFe garnet thin film were collected by step scanning with A20=(}05 ° and t=0"l s using a LiF (200) analyzing crystal. The profile-fitting method was applied to obtain the precise intensities of the characteristic lines selected for all elements, and the LAMA program (Laguitton & Mantler, 1977) was used to determine rapidly their weight percentages (Laguitton & Parrish, 1977). The chemical analysis could thus be completed very rapidly.…”

Section: Resultsmentioning

confidence: 99%

High-speed X-ray analysis

Ayers¹,

Huang²,

Parrish³

1978

J Appl Cryst

View full text Add to dashboard Cite

The profile-fitting method was used to analyze data, collected at speeds up to 1 ° (20) per second with a computer-controlled diffractometer, which gave precise values of intensities and angles of reflections above a selected intensity threshold level. Powder diffraction data with 52 reflections in a 40 ° range were collected and analyzed in a few minutes. This technique has also been applied to X-ray fluorescence spectroscopy, and is applicable to single-crystal diffractometry and wavelength-dispersive electron microprobe analysis. 229

show abstract

Section: Resultsmentioning

confidence: 99%

High-speed X-ray analysis

Ayers¹,

Huang²,

Parrish³

1978

J Appl Cryst

View full text Add to dashboard Cite

show abstract

“…The trends of the curves plotted in Figs 3(b) and 4(b) (n/4 geometry) are similar to those predicted by models for samples of intermediate thickness. 16 It is worth noting that the relationships obtained for 4 2 geometry [Figs 3(a) and qa)] are ambiguous and the intensities do not approach the thick sample limits. These results can be justified in the following way.…”

Section: ~~mentioning

confidence: 99%

Monte Carlo simulation of the matrix and geometrical effects in x‐ray microfluorescence analysis of individual particles

Lankosz

1992

X-Ray Spectrometry

View full text Add to dashboard Cite

A Monte-Carlo model was developed for the simulation of x-ray fluorescence (XRF) from spherical micro-samples including primary and secondary fluorescence events. The interelement and geometrical effects in XRF microanalysis of individual mineral grains were studied. Calculations were performed for grains of Fe,O, containing minor concentration of Ti and for ZaS grains. The results of calculation indicated that the intensities of excited characteristic x-rays depend strongly on the diameter of the irradiated particle, the incident microbeam profile and its diameter.

show abstract

“…From Eqn (1) a theoretical relative ratio of the x-ray intensity from the standard sample having a film thickness DS to the bulk sample ITERATION PROCEDURE intensity is to be obtained. From experimental data a measured ratio of the x-ray intensity from the stan-The determination of the thickness of the film consists dard sample having a film thickness DS to the bulk in solving Eqns (l), (4) and (2) or (3). Figure 2 shows sample intensity is to be obtained.…”

Section: Transition Probability For Considered Line Weight Fraction Omentioning

confidence: 99%

“…For this reason. we tried to improve the accuracy by considering that the X-rays detected contain the following components and investigating each of these separately: ( 1 ) the analyte line of the film excited by the primary x-rays from the x-ray tube: (2) the analyte line of the film excited by characteristic x-rays of the substrate (enhancement effect by characteristic xrays): (3) the analyte line of the film excited by scattering of the primary x-rays from thc substrate (cnhancenicnt effect by scattered x-rays); and (4) scattered and characteristic x-rays from the substrate, which are the main constituent of the background.…”

Section: Introductionmentioning

confidence: 99%

A fundamental parameter method for measurement of the thickness of pure element films by an EDX technique with a proportional detector

Takagi

Shima

et al. 1984

X-Ray Spectrometry

View full text Add to dashboard Cite

I'o\ oliii4i i 1 1 nivc'rsit y of Tec hilology . Tovohiahi 44 ). Japiin Application of the fundamental parameter method to the detenniaation of & I thickness by an EDX technique with a proportional detector was performed by considering that x-rays striking the detector were composed of the following kinds: (1) the analyte l i e of the film excited directly by the primary beam, (2) the analyte line of the film excited secondarily by scattered or characteristic x-rays from the substrate and (3) scattered and characteristic x-rays from the substrate which passed through the film to be analysed. The intensity of all these types were considered theoretically, and the film thickness was evaluated by Gtting the theoretical intensity of the x-rays striking the detector to the experimental intensity, by use of an iteration process. In addition, the accuracy of the theoretical values of intensities excited secondarily was veri6ed by comparison with the experimental values.

show abstract

Simultaneous determination of composition and mass thickness of thin films by quantitative x-ray fluorescence analysis

Cited by 63 publications

References 19 publications

High-speed X-ray analysis

High-speed X-ray analysis

Monte Carlo simulation of the matrix and geometrical effects in x‐ray microfluorescence analysis of individual particles

A fundamental parameter method for measurement of the thickness of pure element films by an EDX technique with a proportional detector

Contact Info

Product

Resources

About