2022
DOI: 10.35848/1347-4065/ac40cf
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Simulation study for GaN-based hybrid trench MOS barrier Schottky diode with an embedded p-type NiO termination: increased forward current density and enhanced breakdown voltage

Abstract: In this work, a hybrid trench MOS barrier Schottky diode (TMBS) structure is proposed to improve both the forward current density and the breakdown voltage (BV) by using TCAD simulation tools. The hybrid structure means that the conventional TMBS rectifier is combined with a p-NiO/n-GaN diode. This can modulate the lateral energy bands by removing the conduction band barriers for electrons. Thus, the improved current spreading effect and the better conductivity modulation can be obtained, leading to the increa… Show more

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Cited by 3 publications
(2 citation statements)
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“…are reported in Ref. 25. The donor-type and acceptor-type trap energy levels of E C − 0.24 eV and E V + 0.46 eV with the trap concentration of 2 × 10 16 cm −3 and 5 × 10 15 cm −3 , respectively are set on the mesa surface.…”
mentioning
confidence: 99%
“…are reported in Ref. 25. The donor-type and acceptor-type trap energy levels of E C − 0.24 eV and E V + 0.46 eV with the trap concentration of 2 × 10 16 cm −3 and 5 × 10 15 cm −3 , respectively are set on the mesa surface.…”
mentioning
confidence: 99%
“…Uno de los parámetros fundamentales que limita la gestión de potencia de estos diodos es el voltaje de ruptura, voltaje en inversa para el cual se produce un aumento brusco de corriente (y normalmente se quema). Al realizar la caracterización de los SBDs, el valor del voltaje de ruptura que se obtiene es generalmente menor que el esperado teóricamente [35,36]. Este hecho se puede estudiar mediante modelos que incluyen los fenómenos físicos que ocurren dentro del dispositivo.…”
Section: Monte Carlounclassified