“…In recent years, based on the developments along different lines described above, successful attempts have been made in using simulation not only to optimize hydrodynamic reactor design and eliminate flow recirculations [77,85] and to predict and optimize deposition rate and uniformity [74,78,131,132], but also to optimize temperature uniformity [47,133], to predict and control formation and transport of particles [134,135], to scale-up existing reactors to larger wafer diameters [136,137], to optimize processing conditions with respect to deposition conformality [52], to predict the influence of process conditions on doping rates [138], to evaluate loading effects on selective deposition rates [15], to study the influence of operating conditions on selectivity loss [123], etc. Also, some studies have been performed that apply transport phenomena modeling to study and optimize the use of CVD in the manufacture of coated powder particles [139,140].…”