Simplest Method for Creating Micropatterned Nanostructures on PDMS with UV Light

Abstract

The fabrication of micropatterned structures on PDMS is a critical step in soft lithography, microfluidics, and many other PDMS-based applications. To substitute traditional mold-casting methods, we develop a simple method to create micropatterned nanostructures on PDMS in one step. After exposing a flat PDMS surface to a UV pen lamp through a photomask (such as a TEM grid), micropatterned nanostructures can be formed readily on the PDMS surface. We also demonstrate that fabricated PDMS can be used for the microcontact printing of protein immunoglobulin (IgG) on solid surfaces. This method is probably the simplest method of creating micropatterned nanostructures on PDMS reported so far because it does not need casting, surface coating, or chemical reagents. Only a UV pen lamp and a photomask are required, and this method can be performed under ambient conditions without vacuum. We expect that this method will greatly benefit researchers who use PDMS regularly in various applications such as soft lithography and microfluidics.

Hierarchically Patterned Elastomeric and Thermoplastic Polymer Films through Nanoimprinting and Ultraviolet Light Exposure

“…In our approach to the fabrication of hierarchical film patterns with a large depth relief over large areas, we have combined soft imprint lithography 12 with an ultraviolet–ozone (UVO) exposure step. 13 In this method, nanoscale digital video disk (DVD) patterns are initially transferred onto an elastomeric substrate [poly(dimethylsiloxane) (PDMS)] through direct nanoimprinting, whereas in-plane and out-of-plane microscale structuring of the films were created by simply UVO irradiating the film through transmission electron microscopy (TEM) grids with different hole configurations. The mechanism of how the wall stress built up at the boundary region of micro-recession is systematically studied.…”

Ordered Array Electrodes Fabricated by a Mask‐Assisted Electron‐Beam Method as Platforms for Studying Kinetic and Mass‐Transport Phenomena on Electrocatalysts

“…Thus, a second material different to the substrate can be selectively deposited over well‐defined regions. The method involves typical steps of different mask‐assisted and e‐beam lithographic techniques reported in the literature,, as it is schematized in Figure . Precursor solutions of PMMA were prepared by dissolving 0.05 g of PMMA monomer in 1.5 mL of the polymerizer under continuous stirring until complete homogenization (typically 3 h).…”

“…For example, patterning of films that are sensitive to an e‐beam (such as PMMA) could be possible using a basic SEM instrument and proper masks. On that sense, techniques that rely on the use of masks for replicating a pattern are based on the modification of sensitive films by a physical or chemical process (e.g., etching,, deposition, chemical transformation by radiation) only on regions that are not covered by a laying mask, which may be followed by a further revealing process. A wide variety of ordered grids and porous membranes machined with micrometric and nanometric precisions can function as masks.…”

“…A wide variety of ordered grids and porous membranes machined with micrometric and nanometric precisions can function as masks. They can be used directly as templates to deposit the metallic array,, or indirectly for fabricating a replicated template adhered on the supporting surface ,. This second option is attractive for obtaining micro‐structured features with well‐defined borders.…”

Invisible photonic printing: computer designing graphics, UV printing and shown by a magnetic field

“…According to literature reports34353637, UV-irradiation will induce PDMS chain scissions, involving both the main chain and the side groups, ultimately leading to the formation of new Si-O-Si bonds. This silica-like structure is denser and more compact, resulting in the rupture of PDMS networks on the surface region.…”