Silicon dioxide thin films prepared by photochemical vapor deposition from silicon tetraacetate

Maruyama, Toshiro; Tago, Teruoki

doi:10.1016/0040-6090(93)90009-e

Cited by 17 publications

(6 citation statements)

References 3 publications

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“…These Si–OH layers react with (tridecafluoroctyl)triethoxysilane molecules. In comparison with other surface modification methods, such as chemical vapor deposition and plasma systems, UVO utilizes relatively inexpensive equipment. − Successful fabrication of the SAM-modified membranes was confirmed by attenuated total reflection Fourier transform infrared (FTIR) spectroscopy, energy-dispersive X-ray (EDX) spectrometry, and CA measurements. Scanning electron microscopy (SEM) and atomic force microscopy (AFM) were also conducted to further understand the microtopographical changes on the membrane surfaces.…”

Section: Introductionmentioning

confidence: 99%

Surface-Modification of Poly(dimethylsiloxane) Membrane with Self-Assembled Monolayers for Alcohol Permselective Pervaporation

Zhang

et al. 2013

Langmuir

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The use of self-assembled monolayers (SAMs) has recently been recognized as an effective way to tailor the surface properties of films used in various applications. However, application of SAMs in the preparation of separation membranes remains unexplored. In the present study, surface-modified poly(dimethylsiloxane) (PDMS) membranes were prepared using SAMs to fabricate a membrane for use in pervaporation separation of ethanol/water mixtures. A cross-linked PDMS/polysulfone (PSf) composite membrane was transformed by introducing hydroxyl functionalities on the PDMS surface through a UV/ozone conversion process. (Tridecafluoroctyl)triethoxysilane was allowed to be adsorbed on the resulting Si-OH substrate to increase the hydrophobicity of the membrane. Results from Fourier transform infrared spectroscopy, scanning electron microscopy, energy-dispersive X-ray spectrometry, atomic force microscopy, and contact angle analyses suggest that the fluoroalkylsilane monolayer was successfully formed on the modified PDMS/PSf membrane treated by 60 min UV/ozone exposure. The newly SAM-modified membrane exhibited a separation factor of 13.1 and a permeate flux of 412.9 g/(m(2) h), which are higher than those obtained from PDMS membranes.

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Section: Introductionmentioning

confidence: 99%

Surface-Modification of Poly(dimethylsiloxane) Membrane with Self-Assembled Monolayers for Alcohol Permselective Pervaporation

Zhang

et al. 2013

Langmuir

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“…It has therefore been of interest to develop SiO x fabrication processes which can be applied at low temperatures. Maruyama and Tago proposed silicon oxide thin films prepared from the precursor silicon tetraacetate by a direct photochemical vapor deposition method. Thin films were obtained in the presence of oxygen gas at a substrate temperature of above 110 °C.…”

Section: Introductionmentioning

confidence: 99%

Effect of UV-Ozone Treatment on Poly(dimethylsiloxane) Membranes: Surface Characterization and Gas Separation Performance

et al. 2009

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A thin SiO(x) selective surface layer was formed on a series of cross-linked poly(dimethylsiloxane) (PDMS) membranes by exposure to ultraviolet light at room temperature in the presence of ozone. The conversion of the cross-linked polysiloxane to SiO(x) was monitored by attenuated total reflectance Fourier transform infrared (ATR-FTIR) spectroscopy, X-ray photoelectron spectroscopy (XPS), energy-dispersive X-ray (EDX) microanalysis, contact angle analysis, and atomic force microscopy (AFM). The conversion of the cross-linked polysiloxane to SiO(x) increased with UV-ozone exposure time and cross-linking agent content, and the surface possesses highest conversion. The formation of a SiO(x) layer increased surface roughness, but it decreased water contact angle. Gas permeation measurements on the UV-ozone exposure PDMS membranes documented interesting gas separation properties: the O(2) permeability of the cross-linked PDMS membrane before UV-ozone exposure was 777 barrer, and the O(2)/N(2) selectivity was 1.9; after UV-ozone exposure, the permeability decreased to 127 barrer while the selectivity increased to 5.4. The free volume depth profile of the SiO(x) layer was investigated by novel slow positron beam. The results show that free volume size increased with the depth, yet the degree of siloxane conversion to SiO(x) does not affect the amount of free volume.

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“…It has therefore been of recent interest to develop SiO x fabrication processes that can be applied at lower temperatures. Chemical vapor deposition (CVD) employs functional siloxane compounds, like tetraethylorthosilane (TEOS), that transform into silicon dioxide in nitrogen or oxygen plasmas. , Once again, these transformations require special environmental conditions and may involve toxic siloxane precursors. In 1993, Kalachev et al proposed one of the first low-temperature processes for conversion of a polysiloxane into silicon oxide.…”

Section: Introductionmentioning

confidence: 99%

Conversion of Some Siloxane Polymers to Silicon Oxide by UV/Ozone Photochemical Processes

et al. 2000

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A variety of linear and cross-linked polysiloxanes are transformed into silicon oxide (SiO x ) through the application of a recently developed room-temperature UV/ozone conversion process. Ozone and atomic oxygen, produced by exposure of atmospheric oxygen to ultraviolet radiation, remove organic portions of the polymers as volatile products and leave a thin silicon oxide surface film. The conversion rates differ for each polysiloxane studied and are related to differences in their chemical structures. X-ray photoelectron spectroscopy (XPS) measurements of atomic ratios indicate that UV/ozone treatment removes up to 89% of the carbon from the resultant surface film, leading to an overall stoichiometry close to that of SiO2. The binding energy of Si(2p) core level photoelectrons shifts from 101.5 eV for the polymer precursors to about 103.5 eV after UV exposure, consistent with the formation of silicon that is coordinated to four oxygen atoms. Ellipsometry measurements of apparent thickness changes during conversion indicate that the SiO x film formed is limited to a thickness on the order of 20−30 nm for poly(dimethylsiloxane) substrates. The results demonstrate that a thin silicon oxide layer can be prepared at room temperature on the surface of polysiloxane films by UV/ozone-induced photochemical reactions.

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Silicon dioxide thin films prepared by photochemical vapor deposition from silicon tetraacetate

Cited by 17 publications

References 3 publications

Surface-Modification of Poly(dimethylsiloxane) Membrane with Self-Assembled Monolayers for Alcohol Permselective Pervaporation

Surface-Modification of Poly(dimethylsiloxane) Membrane with Self-Assembled Monolayers for Alcohol Permselective Pervaporation

Effect of UV-Ozone Treatment on Poly(dimethylsiloxane) Membranes: Surface Characterization and Gas Separation Performance

Conversion of Some Siloxane Polymers to Silicon Oxide by UV/Ozone Photochemical Processes

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