Silicon-based microelectrodes for neurophysiology fabricated using a gold metallization/nitride passivation system

Ensell, G.; Banks, D.; Ewins, D. J.; Balachandran, W.; Richards, P.R.

doi:10.1109/84.506199

Cited by 42 publications

(30 citation statements)

References 10 publications

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“…To achieve this, a number of groups have developed chronically-implantable microelectrodes (e.g. Ensell et al, 1996;Ensell et al, 2000) to interface with the human peripheral nervous system. These types of implantable microelectrodes may also be implanted in the central nervous system as part of neural prostheses; for example a multi-electrode array implanted in the motor cortex and surrounding areas can be used to extract motor signals from the brain, and an online computational device could be used to convert these motor signals into output signals that are capable of controlling an artificial limb (Rousche and Norman, 1998).…”

Section: Introductionmentioning

confidence: 99%

Protein adsorption on materials for recording sites on implantable microelectrodes

Selvakumaran

Keddie

Ewins

et al. 2007

J Mater Sci: Mater Med

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The initial adsorption of proteins to materials for implantable microelectrodes is an important factor in determining the longevity and stability of the implant. Implantable microelectrodes have the potential to become part of neural prosthesis to restore lost nerve function after nerve damage. The aim of this study was to identify an optimum material for electrode recording sites on implantable microelectrodes. Common materials for electrode sites are gold, platinum, iridium, and indium tin oxide; these, along with a reference material (titanium) were investigated. Once an implant is in the body, protein adsorption takes place almost instantly before the cells reach the surface of an implant. In this project, the adsorption of proteins to materials for electrode sites has been investigated using atomic force microscopy and ellipsometry.The protein layers adsorbed to Au after 7 and 28 days were the smoothest and the thinnest compared to all the other substrate materials. Among all the materials studied, Au is the best conductor, the most readily available and has good adhesion strength. Au is the material of choice for electrode recording sites on implantable microelectrodes. This work has demonstrated the suitability of different materials for electrode sites on implantable microelectrodes.

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Section: Introductionmentioning

confidence: 99%

Protein adsorption on materials for recording sites on implantable microelectrodes

Selvakumaran

Keddie

Ewins

et al. 2007

J Mater Sci: Mater Med

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“…The general structure of the probes produced is essentially the same as the structure produced using the boron etch-stop technique previously reported (ENSELL et al, 1996), Fig. 2.…”

Section: Fabrication Proceduresmentioning

confidence: 97%

“…Unlike the boron (ENSELL et al, 1996) Olot to scale. ) etch-stop process (ENSELL et al, 1996), the doping levels of the silicon (shank and carder area) may be specified when the wafer is purchased and there is no deep boron diffusion stage during the fabrication process.…”

Section: Fabrication Proceduresmentioning

confidence: 99%

“…silicon frame cantilever beam tapering ' ' mesa structure beneath to form the shank carrier area Fig. 2 General structure of the probes produced (ENSELL et al, 1996 A 600 nm thick film of silicon dioxide (oxide) was then grown on both sides of the wafers at 1000:C in a wet oxygen environment. This formed a stress relieving layer for a 200 nm thick layer of silicon nitride (nitride) which was then deposited on the wafers using low pressure chemical vapour deposition (LPCVD --740:C with SiC12H 2 and NH 3 as source gases).…”

Section: Fabrication Proceduresmentioning

confidence: 99%

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Silicon-based microelectrodes for neurophysiology, micromachined from silicon-on-insulator wafers

Ensell

Banks

Richards

et al. 2000

Med. Biol. Eng. Comput.

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A process is described for the fabrication of silicon-based microelectrodes for neurophysiology using bonded and etched-back silicon-on-insulator (BESOI) wafers. The probe shapes are defined without high levels of boron doping in the silicon; this is considered as a step towards producing probes with active electronics integrated directly beneath the electrodes. Gold electrodes, of 4 microns by 4 microns to 50 microns by 50 microns are fabricated on shanks (cantilever beams) 6 microns thick and which taper to an area approximately 100 microns wide and 200 microns long, which are inserted into the tissue under investigation. The passive probes fabricated have been successfully employed to make acute recordings from locust peripheral nerve.

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“…While several extracellular MEMS devices have been presented [3][4][5][6][7], only one MEMS approach for intracellular recording has been presented so far [8,9]. We have recently shown that by using silicon micro-fabrication techniques it is possible to realize needles with geometry close to the conventional pulled glass capillaries mentioned above.…”

Section: Introductionmentioning

confidence: 99%

High-aspect ratio submicrometer needles for intracellular applications

Hanein¹,

Schabmueller²,

Holman³

et al. 2003

J. Micromech. Microeng.

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Silicon-based microelectrodes for neurophysiology fabricated using a gold metallization/nitride passivation system

Cited by 42 publications

References 10 publications

Protein adsorption on materials for recording sites on implantable microelectrodes

Protein adsorption on materials for recording sites on implantable microelectrodes

Silicon-based microelectrodes for neurophysiology, micromachined from silicon-on-insulator wafers

High-aspect ratio submicrometer needles for intracellular applications

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