2004
DOI: 10.1049/el:20040574
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Silicon-based electrically driven microcavity LED

Abstract: A silicon pn-diode was embedded into a microcavity composed of a buried metal silicide as bottom reflector and a Si=SiO 2 Bragg mirror as top reflector. Spectral narrowing and an increased intensity of the Si bandgap electroluminescence was observed.Introduction: The realisation of Si-based, electrically driven light emitters is a key requirement for the implementation of low-cost Si-based optoelectronics [1]. Realising Si-based light sources in a process technology compatible with mainstream microelectronics … Show more

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Cited by 6 publications
(8 citation statements)
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References 11 publications
(11 reference statements)
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“…Within this model we are able to explain the EL dependence on current and temperature [16], as well as an electrical bistability occurring at low temperature [17]. Finally, we have fabricated an electrically driven resonant-cavity LED based on silicon [18].…”
Section: Introductionmentioning
confidence: 94%
See 1 more Smart Citation
“…Within this model we are able to explain the EL dependence on current and temperature [16], as well as an electrical bistability occurring at low temperature [17]. Finally, we have fabricated an electrically driven resonant-cavity LED based on silicon [18].…”
Section: Introductionmentioning
confidence: 94%
“…The CoSi 2 layer is formed by ion beam synthesis based on Co + implantation into n-doped (100) Si and subsequent annealing [18]. The top crystalline Si layer is overgrown using molecular beam epitaxy to a total thickness of 370 nm, corresponding to a λ-cavity at a wavelength of 1115 nm.…”
Section: Resonant-cavity Ledmentioning
confidence: 99%
“…4) consists of a buried CoSi 2 layer, which acts as the bottom mirror and the bottom electrical contact, the active layer containing the pn diode, and a top Bragg mirror consisting of 2.5 pairs of Si/SiO 2 . The CoSi 2 layer is formed by ion beam synthesis based on Co C implantation into n-doped (100) Si and subsequent annealing [22]. The top crystalline Si layer is overgrown using molecular beam epitaxy to a total thickness of 370 nm, corresponding to a l-cavity at a wavelength of 1115 nm.…”
Section: Boron Implanted Si Light Emitting Pn Diodesmentioning
confidence: 99%
“…In our B-implanted structures, the electroluminescence (EL) increases with temperature, resulting in a wall-plug efficiency of 0.1% at room temperature [21]. In addition, we have integrated these LEDs into a microcavity [22].…”
Section: Introductionmentioning
confidence: 99%
“…Here we use highly boron doped Si pn junction LEDs, which have been shown to show room-temperature EL at a wavelength of 1150 nm with a reasonably high power efficiency of 40.1% [8,9]. In continuation of our work using a buried CoSi 2 mirror [10], we present here the design and fabrication of a RCLED with two distributed Bragg reflectors (DBR).…”
Section: Introductionmentioning
confidence: 99%