2011
DOI: 10.1143/jjap.50.10pa05
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Silicate Reaction Control at Lanthanum Oxide and Silicon Interface for Equivalent Oxide Thickness of 0.5 nm: Adjustment of Amount of Residual Oxygen Atoms in Metal Layer

Abstract: We present a measurement of the mean density profile of Ca ii gas around galaxies out to ∼200 kpc, traced by Fraunhofer's H & K absorption lines. The measurement is based on cross-correlating the positions of about one million foreground galaxies at z ∼ 0.1 and the flux decrements induced in the spectra of about 10 5 background quasars from the Sloan Digital Sky Survey. This technique allows us to trace the total amount of Ca ii absorption induced by the circumgalactic medium, including absorbers too weak to b… Show more

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Cited by 8 publications
(1 citation statement)
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“…This could be due to the increase of total positive charges as a result of the thicker La 2 O 3 layer. These positive charges are generally attributed to the metal induced [21,23] and oxygen defects [24] in the gateoxide layer. Given the facts above, it is reasonable to assume that approximately the same amount of RCC is distributed near to the W/La 2 O 3 interface.…”
Section: Resultsmentioning
confidence: 99%
“…This could be due to the increase of total positive charges as a result of the thicker La 2 O 3 layer. These positive charges are generally attributed to the metal induced [21,23] and oxygen defects [24] in the gateoxide layer. Given the facts above, it is reasonable to assume that approximately the same amount of RCC is distributed near to the W/La 2 O 3 interface.…”
Section: Resultsmentioning
confidence: 99%