The temperature dependence of the density oscillations ͑layers͒ at the free surface of tetrakis͑2-ethylhexoxy͒silane, a nonmetallic molecular liquid, was investigated using x-ray reflectivity. Below ϳ215 K, the layer parameters weakly vary with temperature, if at all. Above this temperature, the layer spacings and intrinsic layer widths increase continuously, until there is no identifiable layering above 230 K. This transition occurs at T / T c Ϸ 0.23, a temperature region that is usually accessible in metallic liquids but is preempted by freezing in many dielectric liquids.