2008
DOI: 10.1016/j.tsf.2008.08.164
|View full text |Cite
|
Sign up to set email alerts
|

SiGe quantum well thermistor materials

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
2

Citation Types

1
14
0

Year Published

2010
2010
2022
2022

Publication Types

Select...
6
2

Relationship

0
8

Authors

Journals

citations
Cited by 18 publications
(15 citation statements)
references
References 2 publications
1
14
0
Order By: Relevance
“…The MQW Si/SiGe microbolometers have been shown to be superior in terms of TCR to conventional thin film materials used in bolometers such as vanadium oxide and amorphous silicon, with TCR increases thanks to higher Ge content in SiGe layers [1][2][3][4][5]. The on-wafer IV measurements of the triple stack bolometer devices for various Ge content were carried out in a probe station with thermal control with 5 K steps.…”
Section: Bolometer Emulationmentioning
confidence: 99%
See 1 more Smart Citation
“…The MQW Si/SiGe microbolometers have been shown to be superior in terms of TCR to conventional thin film materials used in bolometers such as vanadium oxide and amorphous silicon, with TCR increases thanks to higher Ge content in SiGe layers [1][2][3][4][5]. The on-wafer IV measurements of the triple stack bolometer devices for various Ge content were carried out in a probe station with thermal control with 5 K steps.…”
Section: Bolometer Emulationmentioning
confidence: 99%
“…The TCR is found to be increasing as the bolometer devices' Ge content increases. However, the detector resistance also increases considerably as the increase in Ge content causes more valence band offset [3] [5]. While resistance increase results in lower Joule power dissipation for a constant voltage bias and consequently lower self-heating in the bolometers, high resistance is not ideal in terms of detector noise and responsivity.…”
Section: Bolometer Emulationmentioning
confidence: 99%
“…The TCR is found to be increasing as the bolometer devices' Ge content increases. However, the detector resistance also increases considerably as the increase in Ge content causes more valence band offset [3] [5]. While resistance increase results in lower Joule power dissipation for a constant voltage bias and consequently lower self-heating in the bolometers, high resistance is not ideal in terms of detector noise and responsivity.…”
Section: Bolometer Emulationmentioning
confidence: 99%
“…Polycrystalline SiGe (poly-SiGe, T CR = 2%/K) [6], α-SiGe (T CR = 4.7%/K) [7], and SiGe multi-quantum-well (MQW) (T CR < 3.5%/K) [8]- [12] structures have gathered much attention due to their high TCR values. Among these, single crystal structures of SiGe MQWs exhibit the best 1/f noise performance due to high level of order and material quality.…”
Section: Introductionmentioning
confidence: 99%
“…Recently, by incorporating carbon in SiGe quantum well layers, TCR values up to 4.5%/K were also demonstrated [13]. High Ge content in such MQW structures are shown to increase TCR values, but all efforts so far were limited to below 35% Ge content (T CR < 3.5%/K) due to the large lattice mismatch between Si and Ge, limiting the TCR value to below 3.5%/K in SiGe layers without incorporating other species [8]- [12]. Therefore, there is a need for further increasing the TCR of CMOS compatible materials with good crystal quality, beyond the improvement levels obtained using high Ge content SiGe MQW structures.…”
Section: Introductionmentioning
confidence: 99%