Short-period multilayer X-ray mirrors

Andreev, S. S.; Bibishkin, M. S.; Чхало, Н. И.; Kluenkov, E. B.; Prokhorov, K. A.; Салащенко, Н. Н.; Zorina, M. V.; Schäfers, F.; Shmaenok, L. A.

doi:10.1107/s0909049503015255

Cited by 34 publications

(7 citation statements)

References 8 publications

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“…To overcome this problem, MLs with small (< 20 Å ) d-spacing are required. ML technology can reliably produce MLs with a d-spacing as low as 15 Å (Platonov et al, 2002;Andreev et al, 2003;Liu et al, 2004). Decreasing d-spacing and increasing Bragg angle also implies higher X-ray penetration depth leading to an increased number of layers participating in scattering and a narrower rocking curve.…”

Section: Small D-spacing Mlsmentioning

confidence: 99%

Multilayer X-ray optics at CHESS

et al. 2006

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Almost half of the X-ray beamlines at the Cornell High Energy Synchrotron Source (CHESS) are based on multilayer optics. ;Traditional' multilayers with an energy resolution of DeltaE/E approximately 2% are routinely used to deliver X-ray flux enhanced by a factor of 10(2) in comparison with standard Si(111) optics. Sagittal-focusing multilayers with fixed radius provide an additional factor of 10 gain in flux density. High-resolution multilayer optics with DeltaE/E approximately 0.2% are now routinely used by MacCHESS crystallographers. New wide-bandpass multilayers with DeltaE/E = 5% and 10% have been designed and tested for potential applications in macromolecular crystallography. Small d-spacing multilayers with d < or = 20 A have been successfully used to extend the energy range of multilayer optics. Analysis of the main characteristics of the Mo/B4C and W/B4C small d-spacing multilayer optics shows enhancement in their performance at higher energies. Chemical vapour deposited SiC, with a bulk thermal conductivity of a factor of two higher than that of silicon, has been successfully introduced as a substrate material for multilayer optics. Characteristics of different types of multilayer optics at CHESS beamlines and their applications in a variety of scattering, diffraction and imaging techniques are discussed.

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Section: Small D-spacing Mlsmentioning

confidence: 99%

Multilayer X-ray optics at CHESS

et al. 2006

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“…The fabricated multilayer interference mirrors with ultrashort periods can operate at normal angles of SALASHCHENKO, CHKHALO incidence in the wavelength range λ > 2.3 nm [21,22] due to the interference of radiation reflected from a large number (100-1000) of boundaries. Hence, there appeared a real alternative to zone plates in the con struction of high spatial resolution images.…”

Section: Sxr and Euv Components Of Image Forming Opticsmentioning

confidence: 99%

Diffraction-limited short-wavelength optics: Analysis, fabrication, and application

Салащенко

Чхало

2012

J. Synch. Investig.

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The fundamental physical and technological problems of fabrication and testing, as well as new optics applications providing diffraction quality images (with spatial resolutions varying from tens of nanom eters to several nanometers) at wavelengths of 3-60 nm, are analyzed. This type of optical systems is required in the mass production of very large scale integrated circuits (ICs) (projection nanolithography), nanocerti fication (high resolution X ray microscopy), macrodiagnosis (extraterrestrial astronomy), and in fundamen tal investigations of the interaction between a material (vacuum) and superstrong electromagnetic fields (10 20 -10 23 W/cm 2 ). The current state of interaction studies around the world has been reviewed.

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“…To maintain the high reflection coefficients the substrates microroughness should be less than interlayer roughness in multilayer mirrors, that in case of W/B4C is about 0.2 nm [6].…”

Section: Introductionmentioning

confidence: 99%

Application of cerium oxide nanopowders for silicon polishing

et al. 2022

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The research methods and the first results obtained in the study of the roughness of single-crystal silicon (111) substrates processed at the final stage by various methods are described: traditional polishing without the use of chemical-mechanical polishing (CMP), with the use of CMP and without CMP, but with the use of oxide cerium nanopowders. The efficiency of using CeO2 nanopowders has been demonstrated. The following effective roughness values were obtained: without CMP - 3.56 nm, with CMP - 0.54 nm, and without CMP, but with CeO2 polishing - 0.93 nm. Keywords: Surface, roughness, X-ray optics, deep grinding-polishing.

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Short-period multilayer X-ray mirrors

Cited by 34 publications

References 8 publications

Multilayer X-ray optics at CHESS

Multilayer X-ray optics at CHESS

Diffraction-limited short-wavelength optics: Analysis, fabrication, and application

Application of cerium oxide nanopowders for silicon polishing

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