2017
DOI: 10.1038/s41467-017-00734-x
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Short-channel field-effect transistors with 9-atom and 13-atom wide graphene nanoribbons

Abstract: Bottom-up synthesized graphene nanoribbons and graphene nanoribbon heterostructures have promising electronic properties for high-performance field-effect transistors and ultra-low power devices such as tunneling field-effect transistors. However, the short length and wide band gap of these graphene nanoribbons have prevented the fabrication of devices with the desired performance and switching behavior. Here, by fabricating short channel (L ch ~ 20 nm) devices with a thin, high-κ gate dielectric and a 9-atom … Show more

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Cited by 334 publications
(373 citation statements)
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“…Recent breakthroughs in bottom-up chemical synthesis can produce GNRs with atomistically pristine edge states and overcome this shortcoming 19 . In fact, a recent experimental work demonstrated working transistors with 9-and 13-AGNRs made with these techniques 22 . The methods used to synthesize these ribbons can also be used to generate complex periodic structures beyond simply armchair and zigzag nanoribbons 23,24 .…”
mentioning
confidence: 99%
“…Recent breakthroughs in bottom-up chemical synthesis can produce GNRs with atomistically pristine edge states and overcome this shortcoming 19 . In fact, a recent experimental work demonstrated working transistors with 9-and 13-AGNRs made with these techniques 22 . The methods used to synthesize these ribbons can also be used to generate complex periodic structures beyond simply armchair and zigzag nanoribbons 23,24 .…”
mentioning
confidence: 99%
“…At lower temperature and smaller ribbon width, the I max /I min is expected to increase. For example, for a very small ribbon width of only 9 to 13 atoms width, the I max /I min is around ∼1000 (V g � 0-20 V dc ) [48].…”
Section: Resultsmentioning
confidence: 99%
“…Standard Si/SiO 2 (highly p‐doped, 0.001 Ω*cm) with a thermally grown SiO 2 (285 nm) was used as the substrate. Metal pads were defined using electron‐beam lithography in PMMA 50K/950K followed by a metallization step (5 nm Ti/40 nm Pt) 5. Chemical vapor deposition‐grown graphene (Graphenea) was transferred on top and patterned into 400 nm wide stripes using reactive ion etching (Ar/O 2 ) after another step of e‐beam lithography.…”
Section: Methodsmentioning
confidence: 99%
“…The last decade has brought significant advances in the bottom–up fabrication of atomically precise graphene nanomaterials1 and structures of increasing complexity 2–4. While graphene nanoribbons (GNRs) with zigzag edges (ZGNRs) so far have not been integrated into devices due to their reactivity, major progress in the processing of GNRs with armchair edges (AGNRs) has been achieved, and field effect transistors (FETs) that exploit their sizable electronic bandgaps have recently been reported 5,6. However, the large bandgaps of the currently available AGNRs severely limit device performances due to significant Schottky barriers at the contacts.…”
Section: Figurementioning
confidence: 99%