1995
DOI: 10.1103/physrevb.51.14330
|View full text |Cite
|
Sign up to set email alerts
|

Shape transition in the epitaxial growth of gold silicide in Au thin films on Si(111)

Abstract: Growth of epitaxial gold silicide islands on bromine-passivated Si (111) substrates has been studied by optical and electron microscopy, electron probe micro analysis and helium ion backscattering. The islands grow in the shape of equilateral triangles up to a critical size beyond which the symmetry of the structure is broken, resulting in a shape transition from triangle to trape- Typeset using REVT E X 1

Help me understand this report
View preprint versions

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2
1

Citation Types

0
53
1

Year Published

1999
1999
2021
2021

Publication Types

Select...
7

Relationship

1
6

Authors

Journals

citations
Cited by 70 publications
(57 citation statements)
references
References 35 publications
0
53
1
Order By: Relevance
“…2(c)). As time progressed, it tried to rearrange itself to get minimum energy configuration [17,18] which resulted in formation of rectangular/square shaped silicide structures ( fig. 2(d) and 2(e)).…”
Section: Resultsmentioning
confidence: 99%
“…2(c)). As time progressed, it tried to rearrange itself to get minimum energy configuration [17,18] which resulted in formation of rectangular/square shaped silicide structures ( fig. 2(d) and 2(e)).…”
Section: Resultsmentioning
confidence: 99%
“…3B). A qualitatively identical size dependence of both equilibrium and growth forms of particles has been experimentally demonstrated for a wide range of particle/substrate systems, including those for which the particles partially wet the substrate, e.g., InAs on GaP(001) (10), and those for which the particles fully wet the substrate, e.g., Si x Ge 1Ϫx on Si(001) (5,6,29,30), CoSi 2 on Si(001) (7,31), Au-Si on Si(111) (32), and InGaAs on various orientations of GaAs (33).…”
Section: Resultsmentioning
confidence: 98%
“…This sample is described as Br-Si(111) substrate. These type of substrates were used in many growth studies including those in refs [12,20,21,23,24]. Ge was deposited by thermal evaporation at the rate of 0.5 nm/s on BrSi(111) substrates kept at room temperature (RT) under high vacuum ( 3 ¢ 10 6 torr).…”
Section: Methodsmentioning
confidence: 99%
“…In room temperature vacuum deposition, epitaxial Ag layers have been grown on Br-Si(111) surfaces [20]. Epitaxial gold silicide islands have been grown on Br-Si(111) surfaces in a self-assembled process [21] and the phenomenon of shape transition of islands in heteroepitaxial system [22], which might be a route to form quantum wires, has been observed and quantitatively analyzed [23]. Not only Si(111), but also Si(110) surfaces can be passivated by bromine in a brominemethanol treatment.…”
Section: Introductionmentioning
confidence: 99%