Shadow masked pulsed laser deposition of WSex films: Experiment and modeling

Grigoriev, Sergey N.; Fominski, V. Yu.; Романов, Р. И.; Gnedovets, A. G.; Волосова, М. А.

doi:10.1016/j.apsusc.2013.06.020

Cited by 31 publications

(21 citation statements)

References 44 publications

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“…In the case of significantly different atomic weights of the metal and chalcogen (e.g., W versus Se), the shadowed region is characterized by extremely high chalcogen content [6]. Therefore, it is necessary to develop methods ensuring flexible control over the chemical composition and structure of thin film TMD materi als obtained by PLD with an anti droplet shield.…”

mentioning

confidence: 99%

“…Deposition of these particles can be avoided by mounting an anti droplet shield in front of the substrate, so that material behind the shield is deposited from a flow of atoms scattered on a buffer gas [6].…”

mentioning

confidence: 99%

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confidence: 99%

“…The use of PLD techniques for depositing functional TMD films for nano and optoelectronics is hindered by the fact that laser ablation of TMD targets is accompanied by the formation of micro and nanosized particles violating the homogeneity of structure and chemical composition of deposited films [5]. Deposition of these particles can be avoided by mounting an anti droplet shield in front of the substrate, so that material behind the shield is deposited from a flow of atoms scattered on a buffer gas [6].The presence of a shield leads to significant changes in the chemical composition of TMD films, which are related to differences in the dynamics of expansion and the kinematics of collisions of metal and chalcogen atoms with buffer gas molecules. In the case of significantly different atomic weights of the metal and chalcogen (e.g., W versus Se), the shadowed region is characterized by extremely high chalcogen content [6].…”

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Modification of the chemical composition, morphology, and antireflection properties of WSe x films formed by pulsed laser deposition

et al. 2014

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793Thin films of transition metal dichalcogenide (TMDs) including tungsten diselenide (WSe 2 ) have drawn considerable interest due to the layered (lamel lar) structure of these materials, which accounts for a number of extraordinary properties. A weak chemical interaction between lamellae ensures weak resistance to shear, which can be used in tribology for obtaining solid lubricant coatings possessing very low friction coefficients in the absence of traditional lubricants [1]. In addition, TMD films possess semiconductor prop erties, which are retained (and sometimes modified in an unusual manner) in the case of formation of ultrathin or even monolayer films. The semiconductor properties of TMD films are used in creating func tional layers for promising photovoltaic, thermoelec tric, and nanoelectronic devices [2, 3].Thin film TMD materials are most widely obtained using ion plasma sputtering and chemical deposition techniques. Each of these methods has both advantages and drawbacks, which stimulate the search for new methods capable of depositing TMD films with improved characteristics. In particular, the method of pulsed laser deposition (PLD) also allows thin film TMD materials to be obtained with quite good properties for tribological applications [4]. The use of PLD techniques for depositing functional TMD films for nano and optoelectronics is hindered by the fact that laser ablation of TMD targets is accompanied by the formation of micro and nanosized particles violating the homogeneity of structure and chemical composition of deposited films [5]. Deposition of these particles can be avoided by mounting an anti droplet shield in front of the substrate, so that material behind the shield is deposited from a flow of atoms scattered on a buffer gas [6].The presence of a shield leads to significant changes in the chemical composition of TMD films, which are related to differences in the dynamics of expansion and the kinematics of collisions of metal and chalcogen atoms with buffer gas molecules. In the case of significantly different atomic weights of the metal and chalcogen (e.g., W versus Se), the shadowed region is characterized by extremely high chalcogen content [6]. Therefore, it is necessary to develop methods ensuring flexible control over the chemical composition and structure of thin film TMD materi als obtained by PLD with an anti droplet shield. In particular, for the functional layers of photovoltaic devices, it is very important to decrease the reflectance of the TMD film surface, which can exceed 30% for the films manufactured by traditional methods. The same problem is encountered in the creation of sili con based solar cells. In order to decrease the reflec tion coefficient, it is a commonly accepted approach to apply special antireflection coatings [7] or to make the Si matrix surface profiled by using special process ing methods [8].The present work was aimed at studying features of the growth and chemical composition of thin WSe x films obtained by PLD under specific conditions, including t...

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Modification of the chemical composition, morphology, and antireflection properties of WSe x films formed by pulsed laser deposition

et al. 2014

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“…Это позволяло реализовать различные режимы воздействия лазерной плазмы на поверхность растущей пленки. В пер-вом случае на поверхность осаждались в основном низкоэнергетические атомы Mo, испытавшие рассеяние на большие углы при столкновении с молекулами H 2 S. Во втором случае в осаждаемом потоке могли присутствовать атомы Mo с более высокими энергиями, способными оказывать влияние на кинетику поверхностных процессов [4,5].…”

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Влияние локальной атомной упаковки тонких пленок MoS-=SUB=-x-=/SUB=- на их электрокаталитические свойства при восстановлении водорода

Фоминский¹,

Nevolin²,

Романов³

et al. 2017

Письма В Журнал Технической Физики

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Исследуются особенности структуры, состава и электрокаталитические свойства тонких пленок MoSx, полученных методом импульсного лазерного осаждения из мишени Мо в реактивном газе H2S. Факел направлялся по касательной и по нормали к поверхности подложки, что позволило сформировать аморфные пленки с различной локальной упаковкой атомов в аморфной матрице пленок, состоящей из кластеров Mo3-S. Установлено, что ориентация кластеров Mo3-S может оказывать влияние на токопрохождение в катализаторе, а также на тип и поверхностную плотность каталитически активных участков в реакции восстановления водорода. При малых и примерно равных количествах Мо и Pt (~ 4 mug/cm2), осажденных на стеклоуглерод, пленки MoSx уступали пленке Pt по перенапряжению водорода в кислотном растворе на 90 mV, однако при больших катодных потенциалах тонкопленочные катализаторы MoSx превосходили по эффективности тонкопленочную Pt. DOI: 10.21883/PJTF.2017.16.44938.16837

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Development and Characterization of Multilayered Cu/HA/ZnS + PEEK Coating System by Hybrid Technology

Kuśmierczyk

Cieniek

Kopia

et al. 2023

Metall Mater Trans A

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In this study, multilayered Cu/HA/ZnS + PEEK coatings were fabricated using hybrid technology on Zr–2.5Nb alloy substrates. The use of electrophoretic deposition (EPD) and heat treatment allowed the 1st base composite ZnS + PEEK layer and the 2nd hydroxyapatite (HA) top layer to be obtained. The EPD kinetics of both layers was studied. Heating at a temperature of 450 °C and slow cooling resulted in densification and sulfonation of PEEK. It also led to an increase in the adhesion of HA particles on the surface of the PEEK + ZnS layer and to the settlement of HA particles deep into the 1st layer. The effect of substrate preparation on the adhesion strength of coatings was investigated. The ZnS + PEEK layer exhibited high adhesion to the chemically treated zirconium alloy. Furthermore, the first layer was characterized by a high scratch resistance. The selective distribution of Cu on the top of the coating was obtained by shadow-masked pulsed laser deposition (PLD). The multilayered coatings exhibited high roughness and mild hydrophobicity. This study showed the possibility of obtaining a multilayered coating system with a controlled distribution of bioactive components (HA) and antimicrobial components (Cu) on its surface using a hybrid method that combined EPD, heat treatment, and PLD.

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Shadow masked pulsed laser deposition of WSex films: Experiment and modeling

Cited by 31 publications

References 44 publications

Modification of the chemical composition, morphology, and antireflection properties of WSe x films formed by pulsed laser deposition

Modification of the chemical composition, morphology, and antireflection properties of WSe x films formed by pulsed laser deposition

Влияние локальной атомной упаковки тонких пленок MoS-=SUB=-x-=/SUB=- на их электрокаталитические свойства при восстановлении водорода

Development and Characterization of Multilayered Cu/HA/ZnS + PEEK Coating System by Hybrid Technology

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