Set-Up Method on Properties of Ba_XSr_1-XTiO₃ Thin Films Deposited by RF-Magnetron Co-Sputtering by Projecting Temperature and Stoichiometric Effect

Abstract

Thin films (100-400 nm) of BaxSr1-xTiO3 (0≤x≤1) deposited in RF-magnetron co-sputtering equipment are presented in this research work. The change of deposition rate, gap energy, and resistivity as a function of temperature-applied power change in the growth parameters was studied through the ISO colour-code lines constructed with MATLAB:By analysing the trend information and take into account the influence of the calculated "x" parameter with the Boltzmann profile fitting is proposed a method to allow a controlled set up of the RFmagnetron co-sputtering system and predict the Eg and resistivity values in the BaxSr1-xTiO3 solid solution with 0≤x≤1 for amorphous and crystalline phases. Also, a versatile tool to optimise the deposition process and material properties.keywords: BaxSr1-xTiO3 films; boltzmann modelling; optical band gap; deposition rate; stoichiometric content Preprints (www.preprints.org) | NOT PEER-REVIEWED | Posted:

Sputtering Physical Vapour Deposition (PVD) Coatings: A Critical Review on Process Improvement and Market Trend Demands

“…Successively compressed layers are deposited, increasing the adhesion of the deposited film to the substrate [17][18][19][20][21]. Being a cleaner deposition process, sputtering permits a better film densification, and reduces residual stresses on the substrate as deposition occurs at low or medium temperature [56][57][58]. Stress and deposition rate are also controlled by power and pressure.…”

“…However, the process may cause some film contamination by the diffusion of evaporated impurities from the source, thus, there are still some limitations in the selection of the materials that were used for the coatings due to their melting temperature. Being a cleaner deposition process, sputtering permits a better film densification, and reduces residual stresses on the substrate as deposition occurs at low or medium temperature [56][57][58]. Stress and deposition rate are also controlled by power and pressure.…”

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“…This sigmodal mathematical model and the fit with experimental data measured by EDS and XRD has been used to explain the chemical structure and some properties such as: the gap energy, the deposition rate, the crystal size, and the resistivity of the BST on quartz substrates for different temperatures. Also, the relationship with the amorphous or crystalline structure and with deposition areas rich in some of the cations of the BST solid solution (Ba-rich or Sr-rich) [1][2][3][4][5][6][7]. In other types of research, the Ba/Sr, (Ba+Sr)/Ti, Ba/Ti, Sr/Ti ratios have been scrupulously studied in relation to properties such as: electrical, dielectric, and optical.…”