2015
DOI: 10.1016/j.cor.2014.04.016
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Sequencing optimisation for makespan improvement at wet-etch tools

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Cited by 8 publications
(9 citation statements)
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“…An AWS scheduling problem with đ¶ max is tackled by Rotondo et al (2015). Wafer batches are sequenced by a GA, while the internal scheduling is carried out via a proprietary algorithm by the tool vendor.…”
Section: External Ct Scheduling Approaches For Single-machine Environ...mentioning
confidence: 99%
“…An AWS scheduling problem with đ¶ max is tackled by Rotondo et al (2015). Wafer batches are sequenced by a GA, while the internal scheduling is carried out via a proprietary algorithm by the tool vendor.…”
Section: External Ct Scheduling Approaches For Single-machine Environ...mentioning
confidence: 99%
“…Meanwhile, Rotondo et al proposed an optimization model for sequencing batches of wafers outside a wet-etch tool and scheduling of tool internal handler moves [37]. Unlike other authors, these studies address an application of a real manufacturing plant where the wet-etch tools' internal mechanisms are not easy to modify because they are established by the tool vendor.…”
Section: Automated Wet-etch Scheduling Problemmentioning
confidence: 99%
“…However, only a few researchers have reported optimized solutions to the AWS scheduling problem using a combinatorial approach. One of them is Zeballos et al [46] who reported a successful solution with CP combined with different research strategies. These authors reported experimental results with up to three robots, obtaining better results than those obtained by the MILP methodology combined with the Guided Variable Domain Reduction (GVDR) strategy.…”
Section: Automated Wet-etch Scheduling Problemmentioning
confidence: 99%