2014
DOI: 10.2298/ntrp1403179p
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Sensitivity of RADFET for gamma and X-ray doses used in medicine

Abstract: In this paper, the results of radiation sensitive field effect transistors (Al-gate p-channel metal-oxide-semiconductor field effect transistors) sensitivity to gamma and X-ray irradiation are presented. Radiation fields were created using 60Co source for three dose ranges (0-1 Gy, 0-5 Gy, and 0-50 Gy), as well as X-ray unit of 280 kVp spectrum for a single dose range from 0 to 5 Gy. The sensitivity was characterized by the threshold voltage shift, determined from reader circuit measurements,… Show more

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Cited by 12 publications
(9 citation statements)
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“…This is a consequence of different photon energies which lead to ionization of SiO 2 molecules. Namely, X-ray photons energy of 140 keV lead to molecule ionization by both photo effect and Compton's effect, while gamma-ray photons with energies of 1.17 and 1.33 MeV lead to SiO 2 molecules ionization only by Compton's effect [38]. A direct change in Δ V T values is caused by a larger number of FT and ST, which are formed during X-ray irradiation compared to gamma-ray irradiation, the reason being the probability for molecule ionization by photoeffect is significantly higher than by Compton's effect.…”
Section: Influence Of Gate Oxide Thickness On Threshold Voltage Shiftmentioning
confidence: 99%
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“…This is a consequence of different photon energies which lead to ionization of SiO 2 molecules. Namely, X-ray photons energy of 140 keV lead to molecule ionization by both photo effect and Compton's effect, while gamma-ray photons with energies of 1.17 and 1.33 MeV lead to SiO 2 molecules ionization only by Compton's effect [38]. A direct change in Δ V T values is caused by a larger number of FT and ST, which are formed during X-ray irradiation compared to gamma-ray irradiation, the reason being the probability for molecule ionization by photoeffect is significantly higher than by Compton's effect.…”
Section: Influence Of Gate Oxide Thickness On Threshold Voltage Shiftmentioning
confidence: 99%
“…Sensitivity represents threshold voltage shift Δ V T and radiation dose D ratio ( Δ V T / D ) and could be controlled by the gate bias during irradiation. It is well known [37,38] that an increase in sensitivity could be achieved with increase in gate bias during irradiation. In the case of positive gate bias, the sensitivity is higher, than in the case of negative gate bias and the lowest sensitivity being for zero gate bias [20].…”
Section: Important Pmos Dosimetric Parametersmentioning
confidence: 99%
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“…As for gate bias dur ing ir ra di a tion V irr > 0, a large number of holes will es cape the ini tial re-com bi na tion, further in creas ing the prob a bil ity of an in crease in pos itive trapped charge in the ox ide and in ter face traps which, there fore, leads to the in crease in DV T . It is shown [24][25][26] that pos i tive gate bias dur ing ir ra di ation leads to a more lin ear re sponse of MOSFET dosim e ters. More over, the sen si tiv ity of MOSFET dosim e ters can also be in creased with the in crease in ox ide layer thick ness [27,28].…”
Section: Ba Sic Mech a Nisms And Dosimetric Pa Ram E Tersmentioning
confidence: 99%