2015
DOI: 10.1109/ted.2015.2423851
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Sensitivity Improvement in GaAsSb-Based Heterojunction Backward Diodes by Optimized Doping Concentration

Abstract: An impedance-matched voltage sensitivity (β v,opt ) of 20 400 V/W at 94 GHz was achieved at zero bias and room temperature using heterojunction backward diodes that were based on a p + -GaAsSb/i-InAlAs/n-InGaAs that was lattice matched to an InP substrate. Doping concentrations in the diodes were adjusted to optimize the sensitivity and its nonlinear characteristic. The proper donor doping concentration in n-InGaAs to increase its sensitivity was determined to be 1×10 18 cm −3 . Meanwhile, the proper acceptor … Show more

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Cited by 13 publications
(7 citation statements)
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“…Such diodes are expected to act as highsensitivity receiver diodes for signal detection in wireless communication, energy harvesters, and so on. 10,11) To fabricate high-quality NW heterostructures, two bottom-up growth methods, the vapor-liquid-solid (VLS) growth method [12][13][14][15][16][17][18][19] and selective-area epitaxial growth (SAG) method, have been intensively studied. [20][21][22] In VLS growth of III-V semiconductors, Au is commonly used as an ideal catalyst, because Au has relatively low eutectic temperatures with group-III metals and low solubilities in III-V semiconductors.…”
Section: IIImentioning
confidence: 99%
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“…Such diodes are expected to act as highsensitivity receiver diodes for signal detection in wireless communication, energy harvesters, and so on. 10,11) To fabricate high-quality NW heterostructures, two bottom-up growth methods, the vapor-liquid-solid (VLS) growth method [12][13][14][15][16][17][18][19] and selective-area epitaxial growth (SAG) method, have been intensively studied. [20][21][22] In VLS growth of III-V semiconductors, Au is commonly used as an ideal catalyst, because Au has relatively low eutectic temperatures with group-III metals and low solubilities in III-V semiconductors.…”
Section: IIImentioning
confidence: 99%
“…The absolute value was smaller than that of mesa BWDs fabricated from lattice-matched GaAsSb=InGaAs films on InP substrates. 10) This small absolute value of the nonlinearity coefficient was due to the large tunnel barriers. The device performance will be improved by forming smaller tunneling barriers by increasing the doping concentration and=or Sb content of GaAsSb.…”
Section: IIImentioning
confidence: 99%
“…16,17) Sensitivity of the NW BWDs was improved by modifying growth conditions of the NWs and the device structures. 18,19) However, one drawback of BWDs is on their dynamic range, which was limited to below 0 dBm due to their low forward breakdown voltage (FBV) of around 0.4 V. 20) The adoption of extended anode structure in GaAsSb NWs 21,22) shows a significant improvement of the FBV, which signifies that the NW structure contributes not only on improving the sensitivity via the reduction of C j , but also in increasing the dynamic range of microwave power detection.…”
Section: Introductionmentioning
confidence: 99%
“…12,13) Hence, we developed GaAsSb-based BWDs with a type-II p-GaAs 0.51 Sb 0.49 /n-InGaAs heterojunction that is latticematched to an InP substrate. 14,15) The GaAsSb materials, which incorporate arsenide, seem to be more stable than GaSb. We achieved a nanowire (NW) growth technique 16) for forming a small junction area of approximately 0.2 μm without an etching process.…”
mentioning
confidence: 99%
“…The γ has a theoretical limit of q/kT when SBDs are used. 27) On the contrary, BWDs exceeded the γ limitation over the SBDs, 11,15) which improves the η PC . A single-NW BWD displayed a high junction resistance R j of 9.5 GΩ, which was calculated from ∂v/∂i at zero-bias in Fig.…”
mentioning
confidence: 99%