2017
DOI: 10.1016/j.apsusc.2016.02.168
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Self-organized growth and magnetic properties of epitaxial silicide nanoislands

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Cited by 16 publications
(8 citation statements)
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“…In densely packed arrays, interparticle interaction via dipolar fields may take place, leading to superspin glass (SSG) or superferromagnetic (SFM) state, [ 13 , 14 , 15 ]. These three phenomena of “Supermagnetism” (SPM, SSG and SFM), were previously reported by us to take place in epitaxially self-assembled silicide NSs of transition and rare-earth metals, of nonferromagnetic bulk phase origins [ 16 , 17 , 18 , 19 , 20 , 21 ]. Often, at least one-dimensional (1D) in-plane ordering of self-assembled silicide phase NSs can be achieved by their decoration of the periodic vicinal Si(hkl) surface step bunches [ 22 , 23 ], as shown in Figure 1 for 5°-miscut Si(111) in this work.…”
Section: Introductionmentioning
confidence: 58%
“…In densely packed arrays, interparticle interaction via dipolar fields may take place, leading to superspin glass (SSG) or superferromagnetic (SFM) state, [ 13 , 14 , 15 ]. These three phenomena of “Supermagnetism” (SPM, SSG and SFM), were previously reported by us to take place in epitaxially self-assembled silicide NSs of transition and rare-earth metals, of nonferromagnetic bulk phase origins [ 16 , 17 , 18 , 19 , 20 , 21 ]. Often, at least one-dimensional (1D) in-plane ordering of self-assembled silicide phase NSs can be achieved by their decoration of the periodic vicinal Si(hkl) surface step bunches [ 22 , 23 ], as shown in Figure 1 for 5°-miscut Si(111) in this work.…”
Section: Introductionmentioning
confidence: 58%
“…refs. []). In UHV (base pressure 1 × 10 −8 Pa), after thorough degassing, the native silicon oxide was evaporated by repeated flashes at 1150–1200 °C, and the clean Si surface was slowly cooled until well‐ordered (7 × 7) reconstruction appeared in diffraction and STM (pristine surface similar to that in ref.…”
Section: Methodsmentioning
confidence: 99%
“…According to these studies, NiSi 2 films grow epitaxially on Si(111) surface with a (√3 × √3) reconstruction. Other studies suggest that Ni 2 Si, rather than NiSi 2 , forms a (√3 × √3) reconstructed top . Growth of epitaxial films may result in the formation of metastable structures as well, and the characterization of such a multitude of possible surface structures facilitates the need for in situ identification of their crystallography and chemistry.…”
Section: Introductionmentioning
confidence: 99%
“…By implanting nitrogen under the critical conditions, the growth of metal-rich silicide phases is circumvented, as the Ni film converts to the amorphous NiSi phase during annealing 19 . Because of the interest in developing novel spintronic devices, explorations directed toward attempting to combine the charge and spin degrees of freedoms have increased dramatically 1228 . Based on a successful combination of a solution process and the efficient control of the electric potential for magnetism, a novel concept of electric-potential-tuned magnetic recording has been developed, resulting in the development of stable recording media with a high degree of writing ability 20 .…”
Section: Introductionmentioning
confidence: 99%
“…Because of the low resistivity and low fabrication temperature, Ni/Si systems are widely used in the electronics industry as ohmic contacts and interconnects 44,45 . Applications of Ni silicides span numerous areas, including their use in silicon complementary metal-oxide semiconductors 5,12 , field effect transistors 11 , batteries 46,47 and floating gate memory 22 . Ni 2 Si, NiSi and NiSi 2 all appear to be present at Ni/Si interfaces and the composition is dependent on the temperature of the sample and the preparation procedure 6,48,49 .…”
Section: Introductionmentioning
confidence: 99%