Self-organization of β-FeSi2 islands on Si(111)7×7

Silicon layers atop iron silicide nanoislands on Si(100) substrate: Island formation, silicon growth, morphology and structure

“…It is known from Auger electron spectroscopy and electron energy loss spectroscopy [11] that β-FeSi 2 nanosize (30-80 nm) oval shaped (non-crystal) islands are formed on Si(111) substrates during reactive deposition epitaxy at iron coverage 0.2-0.5 nm with iron deposition rate of about 0.6 nm/min. At higher iron thickness (0.6-0.9 nm) crystallization of square or rectangular islands has been observed, island sizes being 70-100 nm.…”

“…One of the possible ways to decrease the silicide island sizes and silicon layer thickness sufficient for complete covering of the islands could be decreasing of the amount of iron deposited on the silicon surface during reactive epitaxy. However, there are only few works [9][10][11] where reactive deposition epitaxy of thinner (d Fe = 0.01-2.0 nm) iron silicides on Si(111) substrates have been studied. As far as we know, such investigations on Si(100) surface still have not been carried out.…”

Formation and transport properties of Si(111)/.BETA.-FeSi2/Si nanocluster structures

“…• C [20]. Iron was deposited on different substrates: atomically clean silicon surface Si(111)7 × 7, Si(111) 7×7-Cr or Si(111)…”

Fabrication and analysis of buried iron silicide microstructures using a focused low energy electron beam

“…Several methods have been applied for the fabrication of bFeSi 2 , including ion-beam synthesis [4], solid-phase epitaxy [5], molecular beam epitaxy [6], and chemical vapor deposition [7]. The growth process of self-assembled b-FeSi 2 nanoparticles and their physical properties have also been hot topics in recent years [8]. However, few studies have been conducted on the area-selective deposition of iron silicides microstructures [7,9].…”