2018
DOI: 10.1002/pssa.201700791
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Self‐Induced Nucleation Growth of GaN Columns by Chemical Vapor Deposition

Abstract: GaN columns are grown by (1 1 1) GaAs nitridation at 1000 °C. GaAs wafers are used as a substrate and Ga source. The nitridation is performed using a hydrogen and ammonia flow mix into a horizontal chemical vapor deposition (CVD) system at atmospheric pressure. XRD in correlation with pole figure shows that the structure is wurtzite with a (0 0 0 2) preferential plane. The SEM images show the growth of GaN columns with an agglomerate formation on top. EDS results show that the agglomerate is Ga rich, suggestin… Show more

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“…The structures completely cover the substrate surface. Our research group has proposed self‐induced nucleation as the growth mechanism for these columns …”
Section: Resultsmentioning
confidence: 99%
“…The structures completely cover the substrate surface. Our research group has proposed self‐induced nucleation as the growth mechanism for these columns …”
Section: Resultsmentioning
confidence: 99%