Abstract. We analyze strain induced effects on the capacitance-voltage (C-V) profile for MBE grown GaAs/In. 1 Ga 0 . 9 As/GaAs HFET structure. The calculations of C-V profile were made using a small-signal approach developed for the quantum well (QW) structures. The self-consistent numerical simulations and results of measurements show that strain causes significant changes in the electron distribution of the QW structure and its C-V profile.