Self-consistent model of a low-pressure rf capacitive discharge

Смирнов, А. С.; Orlov, K. E.

doi:10.1134/1.1261608

Cited by 3 publications

(3 citation statements)

References 2 publications

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“…1, а) и, во-вторых, площадь электрода 1 всегда меньше площади электрода 2. Отсюда следует, что толщина ПС у заземленного электрода будет много меньше, чем толщина слоя у ВЧ электрода (это экспериментальный факт [24]). Таким образом, реактивное сопротивление ПС у электрода с меньшей площадью значительно больше, чем у заземленного и, следовательно, практически вся электромагнитная энергия будет сосредоточена на ВЧ электроде.…”

Section: рис 1 вч плазменный конденсатор: а) -структура реактора длunclassified

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Construction of an Equivalent Electrical Circuit for a High-Frequency Plasma Capacitor

Морозов¹,

Михеев²

2019

HFIM

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High-frequency (HF) low-temperature plasma is widely used for surface cleaning, plasma-chemical sedimentation, and etching of thin layers of various materials in semiconductor and integrated circuit production. In the present day HF plasma is also used for polishing and modification of construction materials, purification of nanopowder surfaces, modification of leather, fur and fabric, pre-sowing seed treatment, and sterilization of medical tools, equipment and materials. A commonly used in practical applications HF device consists of a generator, an energy transmission line, an impedance matching device, and a plasma capacitor as an electric load. In this article, a method of calculation of an equivalent electrical circuit for a plasma capacitor in HF ion-plasma technologies has been developed. An example calculation of a capacitor with electrodes, consisting of earthed cylinder and two electrically connected disk-shaped plates put into it, is demonstrated. The calculation was used for the development of a plasma-chemical installation, which is intended for deposition of silicon-based decorative coatings on glass, earthenware and porcelain products. The developed method of calculation can be employed for designing HF plasma reactors, which are used in industry and experimental research in gas discharge physics.

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Section: рис 1 вч плазменный конденсатор: а) -структура реактора длunclassified

“…Погрешность расчета приведенной емкости ПС плазмы в соответствии с (24), (25) и (27) не более 50 %. Рассчитаем удельную приэлектродную емкость плазмы C sl на частоте 13,56 МГц (ω = 8,52•10 7 рад/с).…”

Section: S S S S S S S S T T S Sunclassified

Construction of an Equivalent Electrical Circuit for a High-Frequency Plasma Capacitor

Морозов¹,

Михеев²

2019

HFIM

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“…Ar was used as operating gas with background pressure 4 -30 mtorr. The discharge was operating with a loaded power range from 0.5 to 100 W, which corresponded to an rf voltage amplitude range 100-10 3 V and provided the bulk plasma density 8 10 8 -5 10 9 cm ÿ3 [5]. Because of low operating pressures and the difference in the electrode area, the discharge was asymmetric and the voltage drop in the grounded electrode sheath was lower than on the powered electrode.…”

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rf Electrode Sheath Formation near a Concave Electrode

et al. 2004

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In this work we present experimental results concerning electrode sheath and ion flux formation near a concave electrode with the dimension of a cavity comparable to the electrode sheath length. It is shown that the secondary electron emission can play a crucial role in plasma molding over the electrode surface. It is also observed that plasma has a tendency to "self-leakage" in electrode cavities.

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