1974
DOI: 10.1063/1.1655442
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Selectively etched diffraction gratings in GaAs

Abstract: Selective etching techniques are described which have been utilized to fabricate V-groove diffraction gratings with spatial frequencies greater than 4000 lines/mm in {100} surfaces of GaAs.

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Cited by 44 publications
(8 citation statements)
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“…To reliably meet this requirement when fabricating gratings with submicron periodicity, thin photoresist films are needed. In previous work, 1000 A photoresist films were used in the fabrication of a 2400 A period mask [Come74].…”
Section: Photoresist Considerationsmentioning
confidence: 99%
“…To reliably meet this requirement when fabricating gratings with submicron periodicity, thin photoresist films are needed. In previous work, 1000 A photoresist films were used in the fabrication of a 2400 A period mask [Come74].…”
Section: Photoresist Considerationsmentioning
confidence: 99%
“…Recently, microstructures (textures) produced on a crystal surface by the chemical and electrochemical etching methods were demonstrated to greatly improve the performance of some optical and electro-optical devices; these improvements were attributed to the large surface-to-volume ratio after etching [5][6][7][8][9][10][11][12]. However, a three-electrode electrochemical setup has to be used during the electrochemical texturization, and in most cases of chemical texturization, a periodic mask is necessary [9][10].…”
Section: Introductionmentioning
confidence: 98%
“…However, a three-electrode electrochemical setup has to be used during the electrochemical texturization, and in most cases of chemical texturization, a periodic mask is necessary [9][10]. Spontaneous chemical texturization, i.e., texturization without the use of an electrochemical setup and masks, therefore requires only simple techniques.…”
Section: Introductionmentioning
confidence: 99%
“…Из литературных данных известно, что узкие канавки на поверхности GaAs(001) могут быть получены методом химического [1] или плазмохимического травления [2]. Для последующего эпитаксиального наращивания химическое травление предпочтительнее, поскольку создает минимальный нарушенный слой.…”
Section: Introductionunclassified