External surface diffusion barriers
have proven to be very important
in affecting zeolite catalysis, and surface modification to regulate
surface barriers becomes an effective way to improve zeolite catalysts.
This work probes how chemical vapor deposition (CVD) of SiO2 affects surface barriers and zeolite catalysis, with n-pentane isomerization catalyzed by beta zeolite as the model reaction.
During the deposition, TEOS molecules react with SiOH groups on zeolite
external surface, and SiO2 phase is formed on the surface
in calcination. The deposition temperature of 373 K is preferable,
as it balances the loss of acid sites and the deposition rate. Surface
barriers are reduced after the CVD of SiO2, and an optimal
SiO2 loading should exist as too much SiO2 can
significantly narrow and block surface pores. The SiO2 deposited
Pt/beta catalyst can be up to 132% higher in n-pentane
conversion than its parent counterpart. In terms of the apparent catalytic
activity, an optimal SiO2 loading should exist to balance
the loss of acid sites and the reduction of surface barriers. This
work finds CVD can effectively reduce surface barriers on beta zeolite
and subsequently improve its apparent catalytic activity.