1994
DOI: 10.1063/1.112903
|View full text |Cite
|
Sign up to set email alerts
|

Selective growth of InGaAs on nanoscale InP islands

Abstract: The formation of an InGaAs quantum well on nanoscale InP islands by selective growth using metalorganic vapor phase epitaxy is demonstrated. The structures show intense low-temperature photoluminescence at 1.35 eV. The blueshift of the emission peak by increasing the excitation intensity suggests that the carriers are three-dimensionally confined. The insertion of quantum well into the islands allows a better control of the properties of structures fabricated by the self-organizing growth, a novel technique to… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

0
10
0

Year Published

1995
1995
2019
2019

Publication Types

Select...
6
2
1

Relationship

3
6

Authors

Journals

citations
Cited by 39 publications
(11 citation statements)
references
References 8 publications
0
10
0
Order By: Relevance
“…The quality of the applied commercial-etched silicon tips33 was checked before and after the measurements with a reference sample consisting of small roundshaped quantum dots (InP/GaAs). 34 The mean spring constant of these tips was 36 N m~1, the length was 125 lm and the tip ends were D10 nm in diameter.…”
Section: Atomic Force Microscopymentioning
confidence: 99%
“…The quality of the applied commercial-etched silicon tips33 was checked before and after the measurements with a reference sample consisting of small roundshaped quantum dots (InP/GaAs). 34 The mean spring constant of these tips was 36 N m~1, the length was 125 lm and the tip ends were D10 nm in diameter.…”
Section: Atomic Force Microscopymentioning
confidence: 99%
“…Smaller islands have a relatively homogeneous size distribution ͑Ϯ10%͒ with a base diameter of 100 nm and a height of 20 nm. 10 The larger islands are 50-80 nm high with a base width of 200-300 nm. With similar growth parameters coherently strained and partially relaxed island types were observed when depositing InP on Ga 0.51 In 0.49 P/GaAs by MOVPE.…”
Section: Strain-induced Quantum Dots By Self-organized Stressorsmentioning
confidence: 99%
“…In the well-studied InGaAs/GaAs QD system, modifying the dot structures by combining layers with different composition has proven to be effective for controlling the physical properties of self-assembled QDs [46,47] ) and appeared to have better uniformity. However, increasing the GaAsN thickness to 10 nm or more resulted in significant increase in surface roughness, as shown in Fig.…”
Section: Resultsmentioning
confidence: 99%