Selective formation of hydroxyapatite layers on titanium dioxide

Baryshnikova, Marina; Filatov, L. A.; Kasatkin, Igor; Александров, С. Е.

doi:10.1134/s1070427214110032

Cited by 6 publications

(4 citation statements)

References 13 publications

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“…The crystalline structure found in the anatase phase of TiO 2 leads to an appropriate anatomy for mineral growth on the surface of the biomaterial [ 14 ]. This occurs because the mineralization in the formation of bone tissue is promoted by hydroxyapatite crystals, which are nucleated in this phase [ 15 , 16 ].…”

Section: Discussionmentioning

confidence: 99%

Bioactivity of an Experimental Dental Implant with Anodized Surface

Villaça-Carvalho

Araújo

Beraldo

et al. 2021

JFB

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Background: Several studies proved that anodic oxidation improves osseointegration. This study aimed to optimize osseointegration through anodization in dental implants, obtaining anatase phase and controlled nanotopography. Methods: The division of the groups with 60 titanium implants was: control (CG); sandblasted (SG); anodized (AG): anodized pulsed current (duty cycle 30%, 30 V, 0.2 A and 1000 Hz). Before surgery, surface characterization was performed using Atomic Force Microscopy (AFM), Scanning Electron Microscopy (SEM), X-ray Dispersive Energy Spectroscopy (EDS) and Raman Spectroscopy. For in vivo tests, 10 New Zealand white rabbits received an implant from each group. The sacrifice period was 2 and 6 weeks (n = 5) and the specimens were subjected to computed microtomography (μCT) and reverse torque test. Results: AFM and SEM demonstrated a particular nanotopography on the surface in AG; the anatase phase was proved by Raman spectroscopy. In the μCT and in the reverse torque test, the AG group presented better results than the other groups. Conclusion: The chemical composition and structure of the TiO2 film were positively affected by the anodizing technique, intensifying the biological characteristics in osseointegration.

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Section: Discussionmentioning

confidence: 99%

Bioactivity of an Experimental Dental Implant with Anodized Surface

Villaça-Carvalho

Araújo

Beraldo

et al. 2021

JFB

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“…There are many methods for producing thin semiconductor films -chemical vapor deposition (CVD), atomic layer deposition (ALD), molecular beam epitaxy (MBE), etc [6][7][8][9]. However, in the technology of film deposition, it is important to be able to control and diagnose the materials obtained.…”

Section: Introductionmentioning

confidence: 99%

Features of the Implementation of the Vegard’s Law in Thin Films of Rare Earth Elements Compounds

Khavrov

Kaminski

Шаренкова

et al. 2019

KEM

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In this work, the fulfillment of Vegard's law in thin polycrystalline films Sm1-xGdxS and Sm1-xEuxS, obtained by the method of explosive evaporation of the powder in vacuum, is investigated. It is shown that compliance with the Vegard law in the manufacture of thin-film structures based on Sm1-xEuxS solid solutions is possible only with the same technological parameters of film deposition, in particular, the substrate temperature. In the case of the Sm1-xGdxS solid solutions, the law is observed only in the metal phase of the solid solutions, with x> 0.12.

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“…In CVD of TiO 2 the use of titanium tetraisopropoxide (TTIP) and oxygen as precursors allows to deposit high quality layers at relatively low temperatures . This method has been employed for fabrication of titania thin films with different phase composition and microstructure . Despite of numerous reports on CVD of TiO 2 layers the growth mechanism remains insufficiently studied for reliable control of morphology and structure of the layers.…”

Section: Introductionmentioning

confidence: 99%

Evolution of the microstructure in titanium dioxide films during chemical vapor deposition

Baryshnikova

Filatov

Mishin

et al. 2015

Phys. Status Solidi A

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Chemical vapor deposition (CVD) provides fabrication of high purity conformal layers of titanium dioxide with different structure for various applications. In this work CVD of titania layers from titanium tetraisopropoxide (TTIP) and oxygen at 1 kPa and in the substrate temperature range Ts = 300–500 °C was studied. It was found that growth of TiO2 is a non‐stationary process. Two periods of time characterized by different deposition rates were observed. Formation of amorphous TiO2 occurs at the initial period of the deposition process whereas polycrystalline titania with anatase crystal structure is deposited at the second period. Substrate temperature determines degree of crystallinity, texture, and microstructure of the deposited titania layers.

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Selective formation of hydroxyapatite layers on titanium dioxide

Cited by 6 publications

References 13 publications

Bioactivity of an Experimental Dental Implant with Anodized Surface

Bioactivity of an Experimental Dental Implant with Anodized Surface

Features of the Implementation of the Vegard’s Law in Thin Films of Rare Earth Elements Compounds

Evolution of the microstructure in titanium dioxide films during chemical vapor deposition

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