Evolution of the microstructure in titanium dioxide films during chemical vapor deposition

Baryshnikova, Marina; Filatov, L. A.; Mishin, M. V.; Uvarov, A. A.; Kondrateva, Anastasia; Alexandrov, Sergei

doi:10.1002/pssa.201532300

Cited by 7 publications

(7 citation statements)

References 30 publications

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“…In the literature, TiO2 films have been obtained by various techniques such as physical vapor deposition [6] (PVD), atomic layer deposition (ALD) [7], metalorganic or plasma enhanced chemical vapor deposition (MOCVD, PECVD) [8][9][10][11], reactive magnetron sputtering [12] and liquid techniques such as sol-gel [13] or electrodeposition [14]. This large variety of techniques results in a wealth of morphological forms and crystalline phases.…”

Section: Graphical Abstract Introductionmentioning

confidence: 99%

In- and out-plane transport properties of chemical vapor deposited TiO2 anatase films

et al. 2021

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Due to their polymorphism, TiO2 films are quintessential components of state-of-the-art functional materials and devices for various applications from Dynamic Random Access Memory to Solar Water Splitting. However, contrary to other semiconductor/dielectric materials, the relationship between structural/morphological and electrical properties at the nano and micro scales remains unclear. In this context, the morphological characteristics of TiO2 films obtained by Metal-Organic Chemical Vapor Deposition (MOCVD) and Plasma Enhanced Chemical Vapor Deposition (PECVD), the latter including nitrogen doping, are investigated and they are linked to their in-plane and out-plane electrical properties. A transition from dense to tree-like columnar morphology is observed for the MOCVD films with increasing deposition temperature. It results in the decrease of grain size and the increase of porosity and disorder, and subsequently it leads to the decrease of lateral carrier mobility. The increase of nitrogen amount in the PECVD films enhances the disorder in their pillar-like columnar

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Section: Graphical Abstract Introductionmentioning

confidence: 99%

In- and out-plane transport properties of chemical vapor deposited TiO2 anatase films

et al. 2021

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“…Thinning of the specimen anatase TiO 2 films can be used in photocatalysis as well as in electrophotocatalysis. They are produced by various methods: sol-gel [13], anodization [14], reactive magnetron sputtering [15], atomic layer deposition (ALD) [16] or metalorganic chemical vapor deposition (MOCVD) [4,17,18]. This last process interestingly enables the production of various hierarchical morphologies that have an impact on the photocatalytic properties [5,19].…”

mentioning

confidence: 99%

“…A significant number of results has been reported on the determination of the morphology [16,18,28,29], the crystallographic phases [22], the mechanical residual stress [26,30], the purity [2], the electrical transport [9], and the optical band-gap [31]. However, there is no systematic, holistic study of TiO 2 films in the context of a strong morphology evolution that connects all of these characteristics to the evolution of their photocatalytic properties.…”

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confidence: 99%

TiO2 nanotree films for the production of green H2 by solar water splitting: From microstructural and optical characteristics to the photocatalytic properties

Miquelot

Debieu

Rouessac

et al. 2019

Applied Surface Science

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Green H 2 production by solar water splitting relies entirely on the intrinsic properties of the photocatalyst. In this study the impact of these intrinsic properties on the photocatalytic activity of anatase TiO 2 , the quintessential component of state of the art photocatalytic systems was explored at the nanoscale. The exploration involved a holistic microstructural and optical characterization of fully crystallized anatase thin films synthetized by metalorganic chemical vapor deposition. A combination of electron microscopy, spectroscopic ellipsometry, and infrared spectroscopy revealed that when the deposition temperature increased, the morphology evolved from dense to porous and columnar nanostructures. Interestingly, the columns with a complex, tree-like nanostructure photogenerated 18 times more H 2 than the densest sample. This result shows that the beneficial effect of the morphological nano-complexification and crystallographic diversification of the exchange facets on the photocatalytic performance outweighs the detrimental aspects inherent to this evolution, namely the drop of the charge carrier transport and the increase of residual stress. 1. Introduction Research on renewable energy is vital in the current context of global warming and societies that rely on high energy consumption. Hydrogen is a promising source of renewable energy and catalyzed solar water splitting (SWS) is a carbon-free method to produce it. Numerous materials have been tested to catalyze this reaction [1,2]. Among them, TiO 2-because it is non-toxic, chemically stable, abundant and affordable has been widely investigated as a photocatalytic material since Fujishima and Honda's seminal work [3-8]. Despite its high energy band-gap (3.2 eV), crystalline anatase TiO 2 shows attractive opto-electronic properties. It is an indirect semiconductor with a long exciton lifetime [9,10]; it has a conduction band minimum energy level below the redox potential of H+/H 2 (0 V vs. NHE) and a valence band maximum energy level above the redox potential of O 2 /H 2 O (+1.23 V vs. NHE) [11,12].

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“…Taking this into account all samples for this study were deposited in the temperature range 315–400 °С. As has been demonstrated, during the CVD process in the TTIP–O 2 –O 3 –Ar reaction system, substrate temperature and ozone partial pressure were the main process parameters to determine the morphology and structure of the deposited titania layers. One can control the relative amount of crystalline phase in the form of anatase in TiO 2 layers and grain size by variation of these parameters.…”

Section: Resultsmentioning

confidence: 99%

“…Samples of titanium dioxide layers were grown in the TTIP (titanium tetraisopropoxide)–O 2 –O 3 –Ar reaction system using the CVD process described previously . As has been shown, non‐stationary growth of TiO 2 layers is kinetically controlled in the temperature range 250–350 °C, and layers with high thickness uniformity were deposited. As the temperature is increased above 400 °C, the growth rate is controlled by mass transport, and titania layers with poor thickness uniformity are formed.…”

Section: Resultsmentioning

confidence: 99%

CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

Baryshnikova

Filatov

Petrov

et al. 2015

Chemical Vapor Deposition

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This paper describes the results of experimental evaluation of titanium dioxide thin films formed by CVD as active layers in semiconductor, resistive sensors for detection of ethanol vapors. TiO 2 layers with a thickness of 90 nm are formed by CVD in the TTIP-O 2 -O 3 -Ar reaction system. Sensors manufactured with titania films formed under all the deposition conditions studied exhibit good electrical response to the ethanol vapors, with quick response-recovery characteristics in the temperature range 170-300 8C. Sensor performance is determined by the relative amount of anatase phase and grain size in the films. The response value (R air /R ethanol ) of the sample with the highest degree of crystallinity reached 37 at an operating temperature of 200 8C.

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Evolution of the microstructure in titanium dioxide films during chemical vapor deposition

Cited by 7 publications

References 30 publications

In- and out-plane transport properties of chemical vapor deposited TiO2 anatase films

In- and out-plane transport properties of chemical vapor deposited TiO2 anatase films

TiO2 nanotree films for the production of green H2 by solar water splitting: From microstructural and optical characteristics to the photocatalytic properties

CVD Deposited Titania Thin Films for Gas Sensors with Improved Operating Characteristics

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