Selective deposition and micropatterning of titanium dioxide thin film on self-assembled monolayers

Nanofabrication of Metal Oxide Patterns Using Self-Assembled Monolayers

“…This result is similar to that estimated by QCM measurement (36 nm). The AFM image showed the film roughness to be 3.7 nm (horizontal distance between measurement points: 6.0 m), which is less than that of amorphous TiO 2 thin film (RMS 9.7 nm, 27 nm thick, horizontal distance between measurement points: 6.0 m)) 34 . Additionally, the roughness of the octadecyl group regions was shown to be 0.63 nm (horizontal distance between measurement points: 1.8 m) 39 .…”

“…5(3-a,b)). The center of the anatase TiO 2 t hin film reg io n was 61 nm hig her than the octadecyl regions, and the thickness of the anatase TiO 2 thin film was estimated to be 36 nm considering the thickness of amorphous TiO 2 thin film (27 nm) 34 and OTS molecules (2.4 nm) 39 . This result is similar to that estimated by QCM measurement (36 nm).…”

“…The average line width is 55 μm. Line edge roughness 34 , as measured by the standard deviation of the line width, is ~2.8 μm.…”

“…34 (40 kV, 30 mA) for as-deposited thin films showed that they were composed of amorphous phases. The ratio of oxygen to titanium was evaluated after 20 min of Ar + ion sputtering to www.intechopen.com Nanofabrication of Metal Oxide Patterns Using Self-Assembled Monolayers 5 avoid the influence of the contaminated layer on the surface.…”

“…The ratio of oxygen to titanium was estimated to be 2.2 : 1. Small amounts of chlorine and carbon were also detected (Ti : O : Cl : C = 1 : 2.2 : 0.17 : 0.37) 34 .…”