2016
DOI: 10.1021/acs.nanolett.6b03429
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Selective-Area MOCVD Growth and Carrier-Transport-Type Control of InAs(Sb)/GaSb Core–Shell Nanowires

Abstract: We report the first selective-area growth of high quality InAs(Sb)/GaSb core-shell nanowires on Si substrates using metal-organic chemical vapor deposition (MOCVD) without foreign catalysts. Transmission electron microscopy (TEM) analysis reveals that the overgrowth of the GaSb shell is highly uniform and coherent with the InAs(Sb) core without any misfit dislocations. To control the structural properties and reduce the planar defect density in the self-catalyzed InAs core nanowires, a trace amount of Sb was i… Show more

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Cited by 27 publications
(27 citation statements)
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References 42 publications
(76 reference statements)
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“…Although the growth of Sb-based III-V NWs is more difficult than that of other III-V NWs, both 'top-down' and 'bottomup' approaches have been developed for the controllable growth of high-quality thin Sb-based III-V NWs in the past decade [6,42,52,63,[106][107][108][109][110][111]. 'Top-down' approach has been promoted in microelectronic industry.…”
Section: Recent Advances In the Synthesis Of Sb-based Iii-v Nwsmentioning
confidence: 99%
See 1 more Smart Citation
“…Although the growth of Sb-based III-V NWs is more difficult than that of other III-V NWs, both 'top-down' and 'bottomup' approaches have been developed for the controllable growth of high-quality thin Sb-based III-V NWs in the past decade [6,42,52,63,[106][107][108][109][110][111]. 'Top-down' approach has been promoted in microelectronic industry.…”
Section: Recent Advances In the Synthesis Of Sb-based Iii-v Nwsmentioning
confidence: 99%
“…However, it was rare to study the optoelectronic application of these liquid-grown InSb NWs, probably resulting from their poor crystallinity. Compared to the liquid-grown method, vapor-grown methods including molecular beam epitaxy (MBE) [58][59][60], metal organic vapor phase epitaxy (MOVPE) [21,22,61,62], metal organic chemical vapor deposition (MOCVD) [63,64] and chemical vapor deposition (CVD) [6,41,65], have been adopted commonly to controllable growth of Sb-based III-V semiconductor NWs. Generally, metal particles are used as catalysts for the vapor growth of Sb-based III-V NWs, following two famous growth mechanism of vapor-liquid-solid (VLS) [66,67] and vapor-solid-solid (VSS) [68,69].…”
Section: Introductionmentioning
confidence: 99%
“…3c. This phenomenon has been observed in core–shell nanowires of other material systems [2931], and the behavior highlights the need to improve the crystal quality of the self-catalyzed InGaAs nanowires.
Fig. 3 a HRTEM image of the bare InGaAs nanowire (Xv = 35%) acquired from the < 110> zone axis.
…”
Section: Resultsmentioning
confidence: 67%
“…1). [34] Furthermore, the lack of a catalyst droplet leads to the benefit of avoiding the reservoir effect, which can cause non-abrupt interfaces between different sections of the NW structure. The reservoir effect will be further described later.…”
Section: ) Growth Mechanismsmentioning
confidence: 99%