Abstract:Templated ZnO thin-film growth from the vapor phase is achieved on docosyltrichloro- silane-patterned Si substrates using atomic layer epitaxy (ALE) combined with soft lithography. Patterned hydrophobic self-assembled monolayers (SAMs) are first transferred to single-crystal Si surfaces by hot microcontact printing. Using diethylzinc and water as ALE precursors, crystalline ZnO layers are then grown selectively on the SAM-free surface regions where native hydroxy groups nucleate growth from the vapor phase. Hi… Show more
“…There are various growth methods for TC materials, including metalorganic chemical vapor deposition (MOCVD), ion-assisted deposition (IAD), pulsed laser deposition (PLD) and sputtering [13][14][15][16][17][18][19][20][21][22]. Table 15.2 shows a few of the TCs of interest, such …”
Section: Materials For the Tcs And Their Requirementsmentioning
This chapter describes the application of transparent electrodes to enhance the performance of electro-optic (EO) modulators. Transparent electrodes are typically made from transparent conducting oxides (TCOs). They are electrically conductive while having significantly lower optical absorption loss compared with metals. Their optical refractive indices are typically around n TC ¼ 1.6-2.0, which makes them compatible for use as optical waveguiding materials in organic EO modulators. In this chapter, we show that with use of transparent electrodes as 'bridge electrodes' together with a proper design of a metallic transmission line, high-speed organic EO modulators with substantially lower switching voltages can be realized. In this chapter, we describe in detail the design, fabrication, and characterization of an organic EO modulator based on transparent electrodes. We show that transparent-conductor (TC)-based EO modulator structures can be used to reduce modulator switching voltages by over 5-15x compared with organic modulators based on conventional organic EO modulator structures, while still achieving broad modulation bandwidths of 10-100 GHz, depending on the properties of the transparent conducting materials. The TC-based EO modulator structures are particularly advantageous when Transparent Electronics: From Synthesis to Applications Edited by Antonio Facchetti and Tobin J. Marks
“…There are various growth methods for TC materials, including metalorganic chemical vapor deposition (MOCVD), ion-assisted deposition (IAD), pulsed laser deposition (PLD) and sputtering [13][14][15][16][17][18][19][20][21][22]. Table 15.2 shows a few of the TCs of interest, such …”
Section: Materials For the Tcs And Their Requirementsmentioning
This chapter describes the application of transparent electrodes to enhance the performance of electro-optic (EO) modulators. Transparent electrodes are typically made from transparent conducting oxides (TCOs). They are electrically conductive while having significantly lower optical absorption loss compared with metals. Their optical refractive indices are typically around n TC ¼ 1.6-2.0, which makes them compatible for use as optical waveguiding materials in organic EO modulators. In this chapter, we show that with use of transparent electrodes as 'bridge electrodes' together with a proper design of a metallic transmission line, high-speed organic EO modulators with substantially lower switching voltages can be realized. In this chapter, we describe in detail the design, fabrication, and characterization of an organic EO modulator based on transparent electrodes. We show that transparent-conductor (TC)-based EO modulator structures can be used to reduce modulator switching voltages by over 5-15x compared with organic modulators based on conventional organic EO modulator structures, while still achieving broad modulation bandwidths of 10-100 GHz, depending on the properties of the transparent conducting materials. The TC-based EO modulator structures are particularly advantageous when Transparent Electronics: From Synthesis to Applications Edited by Antonio Facchetti and Tobin J. Marks
“…Controlling such interaction provides an opportunity to nanoengineer the surface properties and to control the thin film growth in designated areas and in 3D nanostructures to give rise to interesting and unexpected functionalities [19,20]. Area selective ALD-based methods have been pursued to overcome these issues [17,[21][22][23][24]. Among them, the use of self-assembled monolayers and polymethyl methacrylate (PMMA) resist layer [25,26] is a particularly attractive route to inhibit or activate selected areas of the substrate [23,[27][28][29][30][31] but the robustness of these organic films against certain ALD conditions is rather poor, being an ineffective selective barrier layer for many ALD processes.…”
“…Photoresist masters have been utilized for replica-molding PDMS structures used in soft lithography (Chen et al, 1997;Jiang et al, 2005;Kane et al, 1999), microfluidics (Beebe et al, 2002;Jeon et al, 2000;Khademhosseini et al, 2004a), microelectronics (Yan et al, 2001), and biological applications, such as the construction of neuronal cell networks (Dertinger et al, 2002;Heller et al, 2005), the design of cellular arrays for high throughput screening Nelson et al, 2003), and other applications (Bhatia et al, 1997;Khademhosseini et al, 2004b;Suh et al, 2004). Indeed, several groups have been seeking to develop alternatives to traditional photolithography for the patterning of photoresists.…”
We report the development of laser-scanning lithography (LSL), which employs a laser-scanning confocal microscope to pattern photoresists that can be utilized, for example, in the fabrication of masters for use in soft lithography. This convenient technique provides even exposure across the entire view field and facilitates accurate alignment of successive photoresist exposures. Features on the scale of 3 microm have been achieved to date with a 10x objective (NA 0.45). Virtual masks, instructions for laser irradiation, were drawn using the Region of Interest (ROI) function of a Zeiss LSM 510 microscope. These regions were then exposed to a 458 nm argon laser for 32 micros (0.9 mW/microm(2)). Differential interference contrast (DIC) imaging was utilized with a non-destructive 514 nm argon laser as an immediate quality check of each exposure, to align successive exposures, and to reduce chromatic aberration between imaging and exposure. Developed masters were replica-molded with poly(dimethylsiloxane) (PDMS); these masters were then utilized for microcontact printing of cell-adhesive self-assembled monolayers (SAMs) to demonstrate the utility of this process. Initial studies confirmed that human dermal fibroblast adhesion and spreading were limited to cell-adhesive SAM areas. LSL is a rapid, flexible, and readily available technique that will accelerate master design and preparation; moreover, it can be applied to additional forms of photolithography and photopolymerization for studies in cell biology, biomaterials design and evaluation, materials science, and surface chemistry.
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