Simulations of the initial oxidation process of a SiC
surface exposed
to O2 and H2O molecules was studied with ReaxFF,
an atomically detailed reactive molecular dynamics method that naturally
models the breaking and forming of bonds. In this work, the ReaxFF
forcefield was first expanded by training it with new quantum mechanics
data of the binding energy, equation of state, and heat of formation
of the SiC crystal, along with data from earlier studies that describes
Si – Si, Si – O, and Si – H interactions. This
expanded ReaxFF forcefield is capable of simultaneously describing
both Si–C–O and Si–O–H bonding interactions.
Using the forcefield, oxidation simulations were performed at various
temperatures (in the range of 500 to 5000 K), and the trajectories
were analyzed. The analyses showed that SiC gradually transforms into
the oxides of silicon with simultaneous formation of a graphite-like
layer. In presence of excess O2, the graphite-like layer
was further oxidized to CO and CO2. We also analyzed the
trajectories with two-atom and three-atom clusters to quantitatively
track the oxidation progress. This analysis clearly showed Si–O
and C–C bond formation at the expense of O–O and Si–C
bond consumption indicating SiC oxidation with simultaneous formation
for carbon-like structure. Consumption of SiC with O2 was
found to be faster than that with H2O. We have also reported
the oxidation simulation of SiC with a mixture of H2O and
O2. Oxidation proceeded effectively as a two-part sequence,
with O2 first oxidizing the SiC, followed then by H2O.