Selected immobilization of individual nanoparticles by spot-exposure electron-beam-induced deposition

Abstract

The use of spot-exposure electron-beam-induced deposition (EBID) to immobilize targeted nanoparticles on a substrate is demonstrated, and investigated using experiment and simulation. Nanoparticles are secured in place through the build-up of carbonaceous material that forms in the region between a particle and substrate when an energetic electron beam is focused onto the particle and projected through to the substrate. Material build-up directly affects the strength of adhesion to the surface, and can be controlled through electron dosage and beam energy. By selectively immobilizing specific particles within surface agglomerations and removing the excess, we illustrate the potential for spot-exposure EBID as a new technique for nanofabrication.

Patterned ion beam implantation of Co ions into a SiO2thin film via ordered nanoporous alumina masks

“…There are many methods for the fabrication of particles on thin films, including chemical and physical vapour deposition [11][12][13], sol-gel [14], and beam induced deposition [15][16][17]. However, ion beam implantation [18][19][20], as proposed here, benefits from exclusive advantages: (i) almost any ions may be implanted into any substrate, (ii) the highest levels of purity can be achieved, and (iii) the depth at which the embedded particles are to be synthesized can be controlled.…”