Segmented Bessel beams

Müller, Angelina; Wapler, Matthias C.; Wallrabe, Ulrike

doi:10.1364/oe.25.022640

Cited by 15 publications

(7 citation statements)

References 10 publications

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“…However, it is difficult to achieve a collimated light sheet with a thickness below a few hundred microns, due to fundamental diffraction limit associated with collimating to a small beam diameter [28]. It is also not possible to facilitate the propagation of a segmented Bessel beam [29], due to the curved geometry and the initial air-to-glass aperture breaking the phase conditions. To approximate a collimated light sheet with minimized sheet thickness and divergence angle, a cylindrical plano-convex lens can be used after a collimator plano-convex lens.…”

Section: Principlesmentioning

confidence: 99%

Light-Sheet Skew-Ray Enhanced Pump-Absorption for Sensing

Chen

François

et al. 2019

J. Lightwave Technol.

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We present a new sensing technique exploiting lightsheet excitation of skew rays in a multimode fiber, which can be applied to enhance the sensitivity of a range of sensing mechanisms such as pump absorption. The underlying principle is that a light sheet (i.e., thin plane of light) can selectively concentrate the optimum ray group, giving rise to enhanced interaction between light and matter (e.g., fluorophores). We compared this excitation method with others in terms of attenuation of pump light through Rhodamine B. It was observed that the attenuation experienced by light-sheet skew rays can be up to one order of magnitude higher than that of collimated skew rays, and three orders of magnitude higher than that of normal-incidence rays.

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Section: Principlesmentioning

confidence: 99%

Light-Sheet Skew-Ray Enhanced Pump-Absorption for Sensing

Chen

François

et al. 2019

J. Lightwave Technol.

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“…Then, the relevant parameter to engineer the length z B of the Bessel beam (irrespective of its diameter) is the width e of the annular slit. Even if straightforward application of geometrical optics ( z B = e /tan θ) can help for dimensioning purposes, accurate analytical estimations [ 36 ] or numerical calculations [ 38 ] are required to set the optimal value of e , since strong modulations of intensity along Z may occur due to diffraction effects caused by such beam truncation. In our conditions, the optimal aperture of the annular slit is e = 420 µm, enabling to obtain a “focal line” of length z B = 21 µm with a smooth intensity profile along Z and a core diameter (= first zero of intensity of the Bessel function) of 0.90 µm FWHM.…”

Section: Methodsmentioning

confidence: 99%

“…Without the annular aperture, the beam intensity distribution shows a long central intense core surrounded by concentric lobes, as expected for a typical Bessel beam generated by such a technique (Figure 1b, 1 st row). Now, introducing the annular aperture truncates the length of the Bessel beam [ 36 ] (Figure 1b, 2 nd row). In addition, by masking the tip of the axicon, this technologically‐simple technique also offers the advantage of filtering out its fabrication imperfections, responsible of nonideal tapered shape of the obtained non‐truncated Bessel beams, [ 37 ] as observed experimentally (Figure 1b, 1 st row).…”

Section: Methodsmentioning

confidence: 99%

Engraving Depth‐Controlled Nanohole Arrays on Fused Silica by Direct Short‐Pulse Laser Ablation

Liu

Clady

Grojo

et al. 2023

Adv Materials Inter

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face plasmon resonances, and fostered the development of advanced sensors. [2,3] Fabricated on dielectric materials, arrays of nano-holes -and more generally regularly-ordered structures composed of subwavelength-diameter holes -form the basis of the architecture of integrated two-dimensional photonic crystals and all-dielectric metasurfaces, able to confine and manipulate light at unprecedented levels (including amplitude, spectral and spatial management). [4] The usual technological approaches for such nanofabrication of both plasmonic and all-dielectric nanostructures rely on various tools and approaches, amongst which focused ion beam, electron beam, photolithography, reactive ion etching, etc. [5,6] These fabrication methods are mature and highly performant, however, they are slow and they require several steps and techniques that need to be optimized for each material used, thereby inevitably increasing the overall costs and complexity of the whole process.Future advanced devices are now calling for making use of the third dimension (Z) in addition to perfectly well controlled planar nanopatterns (in X and Y dimensions). [7] In particular, arrangements made of arrays of nanoholes with depths reaching at least several micrometers may greatly broaden the range of possible designs and functionalities of nanophotonic structures. [7,8] However, the technological fabrication of such deep holes with a cylindrical profile at the surface of materials is challenging. [9][10][11][12] Thus, introducing a versatile fabrication technique that adds the hole depth as a straightforward and independent degree of freedom holds promises to form advanced architectures. In this context, we explore ultrafast laser processing as a direct way to create deep air holes at the surface of a reference dielectric material, fused silica. By "direct" we mean that one hole is fabricated by a single-step process, consisting in only one laser shot to ablate matter, without any extra treatment (like chemical etching for example [13] ) nor translation of the target material. [14] Although the ultimate spatial resolution of direct laser ablation with ultrashort pulses has not reached yet sufficient performance standards to compete with traditional nanofabrication processes to fabricate functional nanophotonic components, our aim is to show it represents a route for an alternative and complementary solution with attractive advantages in terms of speed, maskless and single-step process, absence of need of vacuum environment or chemicals. Additionally, the nanostructures can be fabricated on a single

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“…We assume the typical case that the distance z 0 between axial beam center position and hologram position is larger than the beam length Δz. Then the transmission function T(x,y) and the amplitude A(x,y) of the hologram have an annular shape [30,31]: . The magnification of the illumination system has been set to M ill = 1 in order to keep things simple.…”

Section: Basic Prinmentioning

confidence: 99%

Light-sheet microscopy with length-adaptive Bessel beams

Meinert

2019

Biomed. Opt. Express

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In light-sheet microscopy, a confined layer in the focal plane of the detection objective is illuminated from the side. The illumination light-sheet usually has a constant beam length independent of the shape of the biological object. Since the thickness and the length of the illumination light-sheet are coupled, a tradeoff between resolution, contrast and field of view has to be accepted. Here we show that scanned Bessel beams enable object adapted tailoring of the light-sheet defined by its beam length and position. The individual beam parameters are obtained from automatic object shape estimation by low-power laser light scattered at the object. Using Arabidopsis root tips, cell clusters and zebrafish tails, we demonstrate that Bessel beam light-sheet tailoring leads to a 50% increase in image contrast and a 50% reduction in photobleaching. Light-sheet tailoring requires only binary amplitude modulation, therefore allowing a real time illumination adaptation with little technical effort in the future.

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Segmented Bessel beams

Cited by 15 publications

References 10 publications

Light-Sheet Skew-Ray Enhanced Pump-Absorption for Sensing

Light-Sheet Skew-Ray Enhanced Pump-Absorption for Sensing

Engraving Depth‐Controlled Nanohole Arrays on Fused Silica by Direct Short‐Pulse Laser Ablation

Light-sheet microscopy with length-adaptive Bessel beams

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